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CoCrTa Alloy Sputtering Target High Purity Thin Film Pvd Coating Coating

Cobalt Chromium Tantalum

Kufotokozera Kwachidule:

Gulu

Aloyi Sputtering Target

Chemical Formula

CoCrTa

Kupanga

Cobalt Chromium Tantalum

Chiyero

99.9%, 99.95%, 99.99%

Maonekedwe

Mbale, Zolinga za Column, arc cathodes, Zopangidwa mwamakonda

Njira Yopanga

Kusungunuka kwa Vacuum

Kukula komwe kulipo

L≤200mm, W≤200mm


Tsatanetsatane wa Zamalonda

Zolemba Zamalonda

Cobalt Chromium Tantalum sputtering chandamale amapangidwa ndi kuponyera ndi vacuum kusungunuka. ndipo kenako amapangidwa kukhala mawonekedwe omwe akufuna. Iwo ali mkulu chiyero ndi homogenous microstructure. Co-Cr-Ta inali chinthu chofunikira kwambiri chojambulira maginito chifukwa cha maginito ake: kukakamiza kwambiri, phokoso lotsika komanso masikweya abwino kwambiri.

Rich Special Equipment imagwira ntchito pa Manufacture of Sputtering Target ndipo imatha kupanga Cobalt Chromium Tantalum Sputtering Materials malinga ndi makonda a Makasitomala. Kuti mudziwe zambiri, chonde titumizireni.


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