CoCrTa Alloy Sputtering Target High Purity Thin Film Pvd Coating Custom Made

Cobalt Chromium Tantalum sputtering target is manufactured by casting process and vacuum melting. and are then formed into the desired target shape. It has high purity and homogenous microstructure. Co-Cr-Ta used to be the critical material for magnetic recording for its magnetic properties: high coercivity, low noise property and excellent squareness.

Rich Special Materials specializes in the Manufacture of Sputtering Target and could produce Cobalt Chromium Tantalum Sputtering Materials according to Customers’ specifications. For more information, please contact us.