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CuIn Sputtering Target High Purity Thin Film Pvd Coating Custom Made

Copper Indium

Short Description:


Alloy Sputtering Target

Chemical Formula



Copper Indium




Plates,Column Targets,arc cathodes,Custom-made

Production Process

Vacuum Melting

Available Size


Product Detail

Product Tags

Copper Indium alloy sputtering target is fabricated conventionally by means of vacuum induction melting. Indium could form different types of indium alloys with almost all elements in the periodic table. Copper Indium alloy is a binary alloy, it is usually used as the low melting alloy and brazing alloy.

Copper Indium alloy sputtering target has the noticeable advantage that it could produce PVD coatings with excellent electric conductivity and refined grain size. It could help in the formation of CIGS layers, with compositions of copper (Cu), gallium (Ga), indium (In) and selenium (Se) and are named after their constituent parts. CIGS has high photovoltaic conversion efficiency, so it is adaptable for use as absorbing layer for solar cells.

Rich Special Materials specializes in the Manufacture of Sputtering Target and could produce Copper Indium Sputtering Materials according to Customers’ specifications. For more information, please contact us.

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