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CuAl Sputtering Target High Purity Thin Film Pvd Coating Custom Made

Copper Aluminum

Short Description:


Alloy Sputtering Target

Chemical Formula



Copper Aluminum




Plates,Column Targets,arc cathodes,Custom-made

Production Process

Vacuum Melting

Available Size


Product Detail

Product Tags

Copper Aluminum sputtering target is perfect for a number of industries and applications, due to its high hardness, tensile strength and light weight. It has usually 1-3% copper content and has the similar chemical properties with Aluminum. CuAl has high mechanical properties, excellent machinability, and high-temperature suitability, so it could be the suitable material for high performance Aluminum alloy. High purity CuAl alloy sputtering target could be used in a broad range of industrial fields from semiconductor and electronic functional components.

Rich Special Materials specializes in the Manufacture of Sputtering Target and could produce Copper Aluminum Sputtering Materials according to Customers’ specifications. Our products feature excellent mechanical properties, homogeneous structure, polished surface with no segregation, pores or cracks. For more information, please contact us.

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