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CuCr Sputtering Target High Purity Thin Film Pvd Coating Custom Made

Copper Chromium

Short Description:


Alloy Sputtering Target

Chemical Formula



Copper Chromium




Plates,Column Targets,arc cathodes,Custom-made

Production Process

Vacuum Melting,PM

Available Size


Product Detail

Product Tags

Copper Chromium alloy sputtering target is a Cu-based material with Chromium element added into it. It has high mechanical strength and hardness, excellent electric and heat conductivity. Cu-Cr alloy has gained a variety of applications that operate equipment under high temperatures because of its specific characteristics: high-temperature suitability, oxidation resistance, corrosion resistance and machinability.

Copper Chromium material has high hardness, wear resistance, bend resistance, crack resistance and high transition temperature. is a kind of renewable energy. The trivalent chromium present does not pose hazard to human health. It is also a common conducting material. Copper Chromium has been extensively used in Optoelectronic Technology products, like touch panel, LCD and solar cells.

Rich Special Materials is a Manufacturer of Sputtering Target could produce Copper Chromium Sputtering Materials according to Customers’ specifications. For more information, please contact us.

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