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CoMn Alloy Sputtering Target High Purity Thin Film Pvd Coating Custom Made

Cobalt Manganese

Short Description:

Category

Alloy Sputtering Target

Chemical Formula

CoMn

Composition

Cobalt Manganese

Purity

99.9%,99.95%,99.99%

Shape

Plates,Column Targets,arc cathodes,Custom-made

Production Process

Vacuum Melting,PM

Available Size

L≤200mm,W≤200mm


Product Detail

Product Tags

Cobalt Manganese sputtering target is widely used as the protective coating material for steel, owing to its distinct wear resistant and corrosion resistant behavior. Manganese is used as an alloying element for many different applications. Manganese is a key component of steel. In fact, this chemical element is present in all commercially available steels and is responsible for the steel’s hardness and strength, but to less of an extent than carbon. When manganese is added to alloy, it could significantly improve the magnetic properties.

Rich Special Materials specializes in the Manufacture of Sputtering Target and could produce Cobalt Manganese Sputtering Materials according to Customers’ specifications. For more information, please contact us.


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