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AlNi Alloy Sputtering Target High Purity Thin Film PVD Coating Custom Made

Aluminum Nickel

Short Description:

Category

Alloy Sputtering Target

Chemical Formula

AlNi

Composition

Aluminum Nickel 

Purity

99.9%,99.95%,99.99%

Shape

Plates,Column Targets,arc cathodes,Custom-made

Production Process

Vacuum Melting,PM

Available Size

L≤200mm,W≤200mm


Product Detail

Product Tags

Aluminum Nickel alloy sputtering target is produced by means of vacuum melting and power metallurgy. Mixing Aluminum and Nickel in an amount necessary to provide AlNi casting ingot. The casting ingot is then cut to form the desired target shape. It has high consistency, refined grain size and homogeneous microstructure, without gas puff or pores.

Owing to its excellent combination of the coating and substrate material, the AlNi coating has good performance under 700℃. Now the AlNi sputtering target is extensively used in wear resistant coatings, including cutting tools, molds, automotive and construction industries.

Rich Special Materials is a Manufacturer of Sputtering Target and could produce Aluminum Nickel Sputtering Materials according to Customers’ specifications. For more information, please contact us.


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