Wholesale AlTa Sputtering Target High Purity Thin Film PVD Coating Custom Made Manufacturer and Supplier

Aluminum-Tantalum

AlTa Sputtering Target High Purity Thin Film PVD Coating Custom Made Featured Image

Short Description:

Category	Alloy Sputtering Target
Chemical Formula	AlTa
Composition	Aluminum-Tantalum
Purity	99.9%，99.95%，99.99%
Shape	Plates，Column Targets，arc cathodes，Custom-made
Production Process	Vacuum Melting，PM
Available Size	L≤200mm，W≤200mm

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The targets are prepared by blending Aluminum and Tantalum powders or vacuum melting followed by compaction to full density. The thus compacted materials are optionally sintered and are then formed into the desired target shape.

Aluminum Tantalum sputtering target has high purity, homogeneous microstructure and excellent conductivity. It is widely used in the formation of thin films for flat panel display industry. Aluminum Tantalum could also be added to produce high performance Titanium alloy to improve its high-temperature suitability.

Impurity content of Al-Ta alloy

composition	Content（%）
	Ta	Fe	Si	C	O
AlTa60	55.0~65.0	≤0.05	≤0.02	≤0.01	≤0.05
AlTa70	65.0~75.0	≤0.05	≤0.02	≤0.01	≤0.05

Rich Special Materials specializes in the Manufacture of Sputtering Target and could produce Aluminum Tantalum Sputtering Materials according to Customers’ specifications. Our products feature excellent mechanical properties, homogeneous structure, polished surface with no segregation, pores or cracks. For more information, please contact us.

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