professional factory for Compound Ceramic Sputtering Target - MoAl35wt% Molybdenum Aluminum Alloy Ingot Step Alloy for PVD Coating – Rich

MoAl35wt% Molybdenum Aluminum Alloy Ingot Step Alloy for PVD Coating,
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The fabrication of Chronium Silicon Sputtering Targets comprises the following steps:
1.Vacuum melting of Silicon and Chronium to obtain step alloys.
2.Powder grinding, packed and evacuation.
3.Hot isostatic pressing treatment to get semi-finished products.
4.Machining the rough chromium-silicon alloy sputtering target material to obtain the chromium-silicon alloy sputtering target material.

CrSi is often used as the high resistance film material, it features the high resistance, stability and low temperature coefficient of resistance. Chronium and Silicon could produce many silicide phases like Cr3Si , Cr5Si3, , CrSi , CrSi2. The production process, composition and Heat treatment process of the CrSi film greatly affects its performance.

Rich Special Materials specializes in the Manufacture of Sputtering Target and could produce Chronium Silicon Sputtering Materials according to Customers’ specifications. For more information, please contact us.Quick Details
Place of Origin:
Beijing, China
Brand Name:
Richmat
Model Number:
GH00060
Application:
Vacuum Coating
Shape:
Lumps Pellets Granules
Material:
Molybdenum Aluminum
Chemical Composition:
MoAl35wt%
Packing:
Iron drum

Product Name
MoAl35wt% Lumps
Shape
Lumps, Pieces
Purity
99.99%
MOQ
1 piece