Wholesale Factory Supply Magnetic Material - AlTa Sputtering Target High Purity Thin Film PVD Coating Custom Made – Rich Manufacturer and Supplier

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As for aggressive rates, we believe that you will be searching far and wide for anything that can beat us. We can easily state with absolute certainty that for such good quality at such charges we are the lowest around for Bi Sputtering Target , Cobalt Sputtering Target , Nickel Tungsten Sputtering Target , We also ensure that your selection will be crafted with the highest quality and reliability. Please feel free to contact us for further information.

Factory Supply Magnetic Material - AlTa Sputtering Target High Purity Thin Film PVD Coating Custom Made – Rich Detail:

The targets are prepared by blending Aluminum and Tantalum powders or vacuum melting followed by compaction to full density. The thus compacted materials are optionally sintered and are then formed into the desired target shape.

Aluminum Tantalum sputtering target has high purity, homogeneous microstructure and excellent conductivity. It is widely used in the formation of thin films for flat panel display industry. Aluminum Tantalum could also be added to produce high performance Titanium alloy to improve its high-temperature suitability.

Impurity content of Al-Ta alloy

composition	Content（%）
	Ta	Fe	Si	C	O
AlTa60	55.0~65.0	≤0.05	≤0.02	≤0.01	≤0.05
AlTa70	65.0~75.0	≤0.05	≤0.02	≤0.01	≤0.05

Rich Special Materials specializes in the Manufacture of Sputtering Target and could produce Aluminum Tantalum Sputtering Materials according to Customers’ specifications. Our products feature excellent mechanical properties, homogeneous structure, polished surface with no segregation, pores or cracks. For more information, please contact us.

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This is the first business after our company establish, products and services are very satisfying, we have a good start, we hope to cooperate continuous in the future!