Good Quality Tio2 Sputtering Target - Mocu Sputtering Target High Purity Thin Film Pvd Coating Custom Made – Rich
Good Quality Tio2 Sputtering Target - Mocu Sputtering Target High Purity Thin Film Pvd Coating Custom Made – Rich Detail:
Molybdenum Copper sputtering target is fabricated by means of infiltration sintering: Molybdenum powders sintered and formed into the semi-finished products, combined with a subsequent microwave-assisted aqueous solution strategy. Molybdenum Copper alloy has outstanding physical and mechanical properties: satisfactory electrical and thermal conductivity, low and adjustable coefficient of thermal expansion, wear resistance, and high temperature strength.
Compositions (%) |
Cu |
Mo |
Impurity (%) |
MoCu10 |
10±2 |
Balance |
≤0.1 |
MoCu15 |
15±3 |
Balance |
≤0.1 |
MoCu20 |
20±3 |
Balance |
≤0.1 |
MoCu25 |
25±3 |
Balance |
≤0.1 |
MoCu40 |
40±5 |
Balance |
≤0.1 |
Rich Special Materials specializes in the Manufacture of Sputtering Target and could produce Molybdenum Copper Sputtering Materials according to Customers’ specifications. For more information, please contact us.
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By Nydia from Tunisia - 2017.09.09 10:18
The manufacturer gave us a big discount under the premise of ensuring the quality of products, thank you very much, we will select this company again.
By Naomi from India - 2017.07.28 15:46