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FeCoTa Sputtering Target High Purity Thin Film Pvd Coating Custom Made

Iron Cobalt Tantalum

Short Description:

Category

Alloy Sputtering Target

Chemical Formula

FeCoTa

Composition

Iron Cobalt Tantalum

Purity

99.9%,99.95%,99.99%

Shape

Plates,Column Targets,arc cathodes,Custom-made

Production Process

Vacuum Melting,PM

Available Size

L≤200mm,W≤200mm


Product Detail

Product Tags

Iron Cobalt Tantalum targets are usually available in circular shape and critical thin film materials of vertical magnetic recording media. The considerable amount of Tantalum present in the alloy would result in segregation and present undissolved particles. We employ unique production method which could ensure the homogeneity of the microstructure and improve the mechanical properties of the materials.

Product name

FeCoTa

Fe/wt%

Balance

Balance

Balance

Co/wt%

21.6±0.5

21.9±0.5

20.2±0.5

Ta/wt%

41.1±0.8

39.4±0.8

44.3±0.8

Metal impurity contentppm)

Ni

≤100

≤100

≤100

Al

≤300

≤300

≤300

Si

≤200

≤200

≤200

Gas impurity contentppm)

C

≤200

≤200

≤200

N

≤100

≤100

≤100

O

≤600

≤600

≤600

S

≤75

≤75

≤75

Rich Special Materials specializes in the Manufacture of Sputtering Target and could produce Iron Cobalt Tantalum Sputtering Materials according to Customers’ specifications. For more information, please contact us.


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