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FeAl Sputtering Target High Purity Thin Film Pvd Coating Custom Made

Iron Aluminum Alloy Target

Short Description:

Category

Alloy Sputtering Target

Chemical Formula

FeAl

Composition

Iron Aluminum alloy target

Purity

99.9%,99.95%,99.99%

Shape

Plates,Column Targets,arc cathodes,Custom-made

Production Process

Vacuum Melting

Available Size

L≤2000mm,W≤200mm


Product Detail

Product Tags

Usually, Iron Aluminum alloy sputtering target has 6%-16% content of Aluminum. It shows excellent magnetic properties and is often used in the film deposition of micromotors.
Iron Aluminum alloys are conventionally available in strips with thickness of 0.1-0.5mm. They feature high resistivity, hardness, vibration and impact resistance, combined with low density(6.5~7.2g/m3). Iron cores made from Iron Aluminum sheets has low eddy current loss and light weight.

Iron Aluminum Alloys are segmented into: 1J6. 1J12. 1J16, the number behind J is the content of Aluminum. With the increase of Aluminum content, the magnetic conductivity and resistivity of the materials would be improved, while the saturation magnetic induction – decreased.
Rich Special Materials specializes in the Manufacture of Sputtering Target and could produce Iron Aluminum Sputtering Materials according to Customers’ specifications. For more information, please contact us.


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