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Factory Price For Feco Sputtering Target - Alcr Alloy Sputtering Target High Purity Thin Film Pvd Coating Custom Made – Rich

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We support our consumers with ideal good quality merchandise and large level provider. Becoming the specialist manufacturer in this sector, we have attained wealthy practical encounter in producing and managing for Aluminum Sputtering Target , Femn Sputtering Target , Azo , Our highly specialized process eliminates the component failure and offers our customers unvarying quality, allowing us to control cost, plan capacity and maintain consistent on time delivery.
Factory Price For Feco Sputtering Target - Alcr Alloy Sputtering Target High Purity Thin Film Pvd Coating Custom Made – Rich Detail:

Aluminum Chromium Sputtering Target Description

Aluminum chromium sputtering target from Rich Special Materials is an alloy sputtering material containing Al and Cr. Thus, the Aluminum chromium sputter target has the advantages of these two elements.

Aluminum, also called aluminum, is a chemical element that originated from the Latin name for alum, ‘alumen’ meaningbitter salt. It was first mentioned in 1825 and observed by H.C.Ørsted. The isolation was later accomplished and announced by H.C.Ørsted. “Al” is the canonical chemical symbol of aluminum. Its atomic number in the periodic table of elements is 13 with a location at Period 3 and Group 13, belonging to the p-block. The relative atomic mass of aluminum is 26.9815386(8) Dalton, the number in the brackets indicating the uncertainty.

Chromium is a chemical element that originated from the Greek ‘chroma’, meaning colour. It was early used before 1 AD and discovered by Terracotta Army. “Cr” is the canonical chemical symbol of chromium. Its atomic number in the periodic table of elements is 24 with a location at Period 4 and Group 6, belonging to the d-block. The relative atomic mass of chromium is 51.9961(6) Dalton, the number in the brackets indicating the uncertainty.

Our typical AlCr targets and their properties

Cr-70Al at%

Cr-60Al at%

Cr-50Al at%

Purity (%)

99.8/99.9/99.95

99.8/99.9/99.95

99.8/99.9/99.95

Density(g/cm3)

3.7

4.35

4.55

Grain Size(µm)

100/50

100/50

100/50

Process

HIP

HIP

HIP

Rich Special Materials specializes in the Manufacture of Sputtering Target and could produce Chronium Aluminum Silicon Sputtering Materials according to Customers’ specifications. Our products feature excellent mechanical properties, homogeneous structure, polished surface with no segregation, pores or cracks. For more information, please contact us.


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We persistently execute our spirit of ''Innovation bringing growth, Highly-quality making sure subsistence, Administration marketing reward, Credit history attracting clients for Factory Price For Feco Sputtering Target - Alcr Alloy Sputtering Target High Purity Thin Film Pvd Coating Custom Made – Rich , The product will supply to all over the world, such as: Italy, Iran, Argentina, We have our own registered brand and our company is developing rapidly owing to high quality products, competitive price and excellent service. We sincerely hope to establish business relations with more friends from home and abroad in the near future. We look forward to your correspondence.
  • Customer service staff and sales man are very patience and they all good at English, product's arrival is also very timely, a good supplier.
    5 Stars By Renata from Oman - 2017.12.02 14:11
    We are a small company that has just started, but we get the company leader's attention and gave us a lot of help. Hope we can make progress together!
    5 Stars By Dominic from Sao Paulo - 2017.03.28 12:22