Wholesale Hot New Products Sputtering Target Plate - Nial Alloy Sputtering Target High Purity Thin Film PVD Coating Custom Made – Rich Manufacturer and Supplier

Hot New Products Sputtering Target Plate - Nial Alloy Sputtering Target High Purity Thin Film PVD Coating Custom Made – Rich Featured Image

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It is a good way to improve our products and service. Our mission is to develop creative products to customers with a good experience for Feco Sputtering Target , Ta Sputtering Target , Low Expansion Alloy , We sincerely count on exchange and cooperation with you. Allow us to move ahead hand in hand and attain win-win situation.

Hot New Products Sputtering Target Plate - Nial Alloy Sputtering Target High Purity Thin Film PVD Coating Custom Made – Rich Detail:

Aluminum Nickel alloy sputtering target is produced by means of vacuum melting and power metallurgy. Mixing Aluminum and Nickel in an amount necessary to provide AlNi casting ingot. The casting ingot is then cut to form the desired target shape. It has high consistency, refined grain size and homogeneous microstructure, without gas puff or pores.

Owing to its excellent combination of the coating and substrate material, the AlNi coating has good performance under 700℃. Now the AlNi sputtering target is extensively used in wear resistant coatings, including cutting tools, molds, automotive and construction industries.

Rich Special Materials is a Manufacturer of Sputtering Target and could produce Aluminum Nickel Sputtering Materials according to Customers’ specifications. For more information, please contact us.

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