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CoNiFe Alloy Sputtering Target High Purity Thin Film Pvd Coating Custom Made

Cobalt Nickel Iron

Short Description:

Category

Alloy Sputtering Target

Chemical Formula

CoNiFe

Composition

Cobalt Nickel Iron

Purity

99.9%,99.95%,99.99%

Shape

Plates,Column Targets,arc cathodes,Custom-made

Production Process

Vacuum Melting

Available Size

L≤2000mm,W≤200mm


Product Detail

Product Tags

Cobalt Nickel Iron sputtering target is fabricated by means of vacuum melting. It is extensively used as vacuum electronic device, such as firing tube, oscillation tube, ignitron and transistor. It exhibits coefficient of linear expansion similar as hard glass under -80~450℃. Hence it is often used to produce high air-sealed components with hard glass or ceramics. The coatings deposited by Cobalt Nickel Iron targets have excellent soft magnetic properties.

Rich Special Materials is a Manufacturer of Sputtering Target and could produce Cobalt Nickel Iron Sputtering Materials according to Customers’ specifications. For more information, please contact us.


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