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Wholesale Price China Vacuum Evaporation Vacuum Evaporating - Alcr Alloy Sputtering Target High Purity Thin Film Pvd Coating Custom Made – Rich

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We usually continually offer you the most conscientious consumer services, along with the widest variety of designs and styles with finest materials. These initiatives include the availability of customized designs with speed and dispatch for Indium Bar , Tungsten Silicide Sputtering Target , Nickel Tungsten Sputtering Target , With a wide range, good quality, reasonable prices and good service, we will be your best business partner. We welcome new and old customers from all walks of life to contact us for future business relationships and achieving mutual success!
Wholesale Price China Vacuum Evaporation Vacuum Evaporating - Alcr Alloy Sputtering Target High Purity Thin Film Pvd Coating Custom Made – Rich Detail:

Aluminum Chromium Sputtering Target Description

Aluminum chromium sputtering target from Rich Special Materials is an alloy sputtering material containing Al and Cr. Thus, the Aluminum chromium sputter target has the advantages of these two elements.

Aluminum, also called aluminum, is a chemical element that originated from the Latin name for alum, ‘alumen’ meaningbitter salt. It was first mentioned in 1825 and observed by H.C.Ørsted. The isolation was later accomplished and announced by H.C.Ørsted. “Al” is the canonical chemical symbol of aluminum. Its atomic number in the periodic table of elements is 13 with a location at Period 3 and Group 13, belonging to the p-block. The relative atomic mass of aluminum is 26.9815386(8) Dalton, the number in the brackets indicating the uncertainty.

Chromium is a chemical element that originated from the Greek ‘chroma’, meaning colour. It was early used before 1 AD and discovered by Terracotta Army. “Cr” is the canonical chemical symbol of chromium. Its atomic number in the periodic table of elements is 24 with a location at Period 4 and Group 6, belonging to the d-block. The relative atomic mass of chromium is 51.9961(6) Dalton, the number in the brackets indicating the uncertainty.

Our typical AlCr targets and their properties

Cr-70Al at%

Cr-60Al at%

Cr-50Al at%

Purity (%)

99.8/99.9/99.95

99.8/99.9/99.95

99.8/99.9/99.95

Density(g/cm3)

3.7

4.35

4.55

Grain Size(µm)

100/50

100/50

100/50

Process

HIP

HIP

HIP

Rich Special Materials specializes in the Manufacture of Sputtering Target and could produce Chronium Aluminum Silicon Sputtering Materials according to Customers’ specifications. Our products feature excellent mechanical properties, homogeneous structure, polished surface with no segregation, pores or cracks. For more information, please contact us.


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Wholesale Price China Vacuum Evaporation Vacuum Evaporating - Alcr Alloy Sputtering Target High Purity Thin Film Pvd Coating Custom Made – Rich detail pictures


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We keep on with our enterprise spirit of "Quality, Efficiency, Innovation and Integrity". We intention to create extra worth for our buyers with our prosperous resources, superior machinery, experienced workers and superb services for Wholesale Price China Vacuum Evaporation Vacuum Evaporating - Alcr Alloy Sputtering Target High Purity Thin Film Pvd Coating Custom Made – Rich , The product will supply to all over the world, such as: Uruguay, Botswana, Moldova, We rely on high-quality materials, perfect design, excellent customer service and the competitive price to win the trust of many customers at home and abroad. 95%products are exported to overseas markets.
  • High production efficiency and good product quality, fast delivery and completed after-sale protection, a right choice, a best choice.
    5 Stars By Annabelle from Swansea - 2018.09.23 18:44
    This company has the idea of "better quality, lower processing costs, prices are more reasonable", so they have competitive product quality and price, that's the main reason we chose to cooperate.
    5 Stars By Mary from Ireland - 2018.06.12 16:22