Wholesale Price China Sputtering Target Electronic - Vacuum Coating Material CoFeTaZr target Cobalt-Iron-Tantalum-Zirconium alloy target Magnetron Sputtering target – Rich
Wholesale Price China Sputtering Target Electronic - Vacuum Coating Material CoFeTaZr target Cobalt-Iron-Tantalum-Zirconium alloy target Magnetron Sputtering target – Rich Detail:
Vacuum Coating Material CoFeTaZr target Cobalt-Iron-Tantalum-Zirconium alloy target Magnetron Sputtering target,
CoFeTaZr target,
Chromium cobalt sputtering target from Rich Special Materials is a silvery alloy sputtering material containing Cr and Co.
Chromium is a chemical element that originated from the Greek ‘chroma’, meaning color. It was early used before 1 AD and discovered by Terracotta Army. “Cr” is the canonical chemical symbol of chromium. Its atomic number in the periodic table of elements is 24 with a location at Period 4 and Group 6, belonging to the d-block. The relative atomic mass of chromium is 51.9961(6) Dalton, the number in the brackets indicating the uncertainty.
Cobalt is a chemical element that originated from the German word ‘kobald’, meaning goblin. It was first mentioned in 1732 and observed by G. Brandt. “Co” is the canonical chemical symbol of cobalt. Its atomic number in the periodic table of elements is 27 with a location at Period 4 and Group 9, belonging to the d-block. The relative atomic mass of cobalt is 58.933195(5) Dalton, the number in the brackets indicating the uncertainty.
Chronium Cobalt Sputtering Targets are manufactured by means of Vacuum Melting and PM. CrCo has superior specific strength and has been used in various fields where high wear-resistance was needed including aerospace industry, cutlery, bearings, blades, etc.
Rich Special Materials specializes in the Manufacture of Sputtering Target and could produce Chronium Cobalt Sputtering Materials according to Customers’ specifications. For more information, please contact us.Zirconium iron cobalt tantalum target material is made of high purity cobalt, iron, tantalum, zirconium by high vacuum melting of target material, the technology can effectively control the oxygen content of the target product and the use of special cooling of the mold, is alloy liquid rapid cooling, the alloy target material uniform structure, uniform composition distribution, small, through high temperature and high pressure densification processing, make the material is very dense, This provides a guarantee for the sputtering of high quality films. After heat treatment, the magnetic head ratio (PTF) of the target is significantly increased, and the thin films deposited by the cobalt-iron-tantalum-zirconium target are important soft magnetic layers in the vertical magnetic recording film.
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We've been convinced that with joint efforts, the enterprise between us will bring us mutual benefits. We could guarantee you item excellent and aggressive price tag for Wholesale Price China Sputtering Target Electronic - Vacuum Coating Material CoFeTaZr target Cobalt-Iron-Tantalum-Zirconium alloy target Magnetron Sputtering target – Rich , The product will supply to all over the world, such as: Casablanca, Germany, Sri Lanka, We have now a good reputation for stable quality goods, well received by customers at home and abroad. Our company would be guided by the idea of "Standing in Domestic Markets, Walking into International Markets". We sincerely hope that we could do business with car manufacturers, auto part buyers and the majority of colleagues both at home and abroad. We expect sincere cooperation and common development!
By Cara from Ireland - 2018.10.31 10:02
This manufacturers not only respected our choice and requirements, but also gave us a lot of good suggestions, ultimately， we successfully completed the procurement tasks.
By Polly from Portland - 2018.06.18 19:26
