Wholesale Wholesale Price China Sputtering Target Electronic - CrAl Alloy Sputtering Target High Purity Thin Film PVD Coating Custom Made – Rich Manufacturer and Supplier

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Well-run equipment, specialist income crew, and better after-sales services; We're also a unified major family, anyone stay with the organization value "unification, determination, tolerance" for Zinc Zn Sputtering Target , Magnesium Ingot , Evaporation Boats , We promise to try our greatest to deliver you with high quality and economical products and services.

Wholesale Price China Sputtering Target Electronic - CrAl Alloy Sputtering Target High Purity Thin Film PVD Coating Custom Made – Rich Detail:

The fabrication of Chromium Aluminum Sputtering Targets comprises the following steps:

1. Powder grinding and mixing.

2. Hot isostatic pressing treatment to get semi-finished products.

3. Machining the rough chromium aluminum alloy sputtering target material to obtain the chromium aluminum alloy sputtering target material.

During the deposition process of CrAl sputtering targets, a hard Aluminium-Chrom-Nitrid (AlCrN) coating is formed. This coating shows high hardness and oxidation resistance properties even at high temperature. The cutters could run at high feeds to increase productivity and raise quality when using CNC machines.

Our typical AlCr targets and their properties

	Cr-70Al at%	Cr-60Al at%	Cr-50Al at%
Purity (%)	99.8/99.9/99.95	99.8/99.9/99.95	99.8/99.9/99.95
Density（g/cm³）	3.7	4.35	4.55
Grain Size(µm)	100/50	100/50	100/50
Process	HIP	HIP	HIP

Rich Special Materials specializes in the Manufacture of Sputtering Target and could produce Chronium Aluminum Sputtering Materials, and other CrAl series(for example:CrAlSi，CrAlTi，CrAlZr, CrAlTa，CrAlW，CrAlY，CrAlCe，etc.) according to Customers’ specifications. Our products feature excellent mechanical properties, homogeneous structure, polished surface with no segregation, pores or cracks. For more information, please contact us.

Our typical AlCr targets and their properties

	Cr-70Al at%	Cr-60Al at%	Cr-50Al at%
Purity (%)	99.8/99.9/99.95	99.8/99.9/99.95	99.8/99.9/99.95
Density（g/cm³）	3.7	4.35	4.55
Grain Size(µm)	100/50	100/50	100/50
Process	HIP	HIP	HIP

Rich Special Materials specializes in the Manufacture of Sputtering Target and could produce Aluminum Chromium Sputtering Materials according to Customers’ specifications. Our products feature excellent mechanical properties, homogeneous structure, polished surface with no segregation, pores or cracks. For more information, please contact us.

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Well-run devices, expert profits group, and better after-sales companies; We have been also a unified huge family, everybody keep on with the organization worth "unification, determination, tolerance" for Wholesale Price China Sputtering Target Electronic - CrAl Alloy Sputtering Target High Purity Thin Film PVD Coating Custom Made – Rich , The product will supply to all over the world, such as: Swaziland, Italy, Estonia, Our products are widely sold to Europe, USA, Russia, UK, France, Australia, Middle East, South America, Africa, and Southeast Asia, etc. Our solutions are highly recognized by our customers from all around the world. And our company is committed to continually improving effectiveness of our management system to maximize customer satisfaction. We sincerely hope to make progress with our customers and create a win-win future together. Welcome to join us for business!

Magnetron Sputtering