Wholesale Wholesale Price China Sputtering Target Electronic - CrAl Alloy Sputtering Target High Purity Thin Film PVD Coating Custom Made – Rich Manufacturer and Supplier

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We insist about the theory of growth of 'High excellent, Performance, Sincerity and Down-to-earth working approach' to offer you with great company of processing for Cobalt Pellets , Bi Sputtering Target , Arc Ion Plating , should you have any query or wish to place an initial order please do not hesitate to contact us.

Wholesale Price China Sputtering Target Electronic - CrAl Alloy Sputtering Target High Purity Thin Film PVD Coating Custom Made – Rich Detail:

The fabrication of Chromium Aluminum Sputtering Targets comprises the following steps:

1. Powder grinding and mixing.

2. Hot isostatic pressing treatment to get semi-finished products.

3. Machining the rough chromium aluminum alloy sputtering target material to obtain the chromium aluminum alloy sputtering target material.

During the deposition process of CrAl sputtering targets, a hard Aluminium-Chrom-Nitrid (AlCrN) coating is formed. This coating shows high hardness and oxidation resistance properties even at high temperature. The cutters could run at high feeds to increase productivity and raise quality when using CNC machines.

Our typical AlCr targets and their properties

	Cr-70Al at%	Cr-60Al at%	Cr-50Al at%
Purity (%)	99.8/99.9/99.95	99.8/99.9/99.95	99.8/99.9/99.95
Density（g/cm³）	3.7	4.35	4.55
Grain Size(µm)	100/50	100/50	100/50
Process	HIP	HIP	HIP

Rich Special Materials specializes in the Manufacture of Sputtering Target and could produce Chronium Aluminum Sputtering Materials, and other CrAl series(for example:CrAlSi，CrAlTi，CrAlZr, CrAlTa，CrAlW，CrAlY，CrAlCe，etc.) according to Customers’ specifications. Our products feature excellent mechanical properties, homogeneous structure, polished surface with no segregation, pores or cracks. For more information, please contact us.

Our typical AlCr targets and their properties

	Cr-70Al at%	Cr-60Al at%	Cr-50Al at%
Purity (%)	99.8/99.9/99.95	99.8/99.9/99.95	99.8/99.9/99.95
Density（g/cm³）	3.7	4.35	4.55
Grain Size(µm)	100/50	100/50	100/50
Process	HIP	HIP	HIP

Rich Special Materials specializes in the Manufacture of Sputtering Target and could produce Aluminum Chromium Sputtering Materials according to Customers’ specifications. Our products feature excellent mechanical properties, homogeneous structure, polished surface with no segregation, pores or cracks. For more information, please contact us.

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We keep on with the basic principle of "quality to start with, support very first, continuous improvement and innovation to meet the customers" for your management and "zero defect, zero complaints" as the quality objective. To great our service, we offer the items with all the superior top quality at the reasonable selling price for Wholesale Price China Sputtering Target Electronic - CrAl Alloy Sputtering Target High Purity Thin Film PVD Coating Custom Made – Rich , The product will supply to all over the world, such as: Macedonia, moldova, Riyadh, Our products have won an excellent reputation at each of the related nations. Because the establishment of our firm. we have insisted on our production procedure innovation together with the most recent modern day managing method, attracting a sizable quantity of talents within this industry. We regard the solution good quality as our most vital essence character.

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The factory technical staff not only have high level of technology, their English level is also very good, this is a great help to technology communication.