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TiTa Sputtering Target High Purity Thin Film Pvd Coating Custom Made

Titanium Tantalum

Short Description:

Category

Alloy Sputtering Target

Chemical Formula

TiTa

Composition

Titanium Tantalum

Purity

99.9%,99.95%,99.99%

Shape

Plates,Column Targets,arc cathodes,Custom-made

Production Process

Vacuum Melting,PM

Available Size

L≤200mm,W≤200mm


Product Detail

Product Tags

Titanium Tantalum sputtering target is fabricated by means of melting and casting. Ti-Ta alloy is a critical material for nuclear waste disposal device component. It also has superior mechanical property, which is the first consideration in its use as orthopaedic implant materials. Besides, TiTaN coating is extensively used in mold cutting tool industry for its excellent wear and corrosion resistance.

Rich Special Materials is a Manufacturer of Sputtering Target and could produce Titanium Tantalum Sputtering Materials according to Customers’ specifications. For more information, please contact us.


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