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PriceList for Magnesium Fluoride Mgf2 Sputtering Target - Aluminum – Rich

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With our loaded encounter and considerate services, we have now been recognized as a trustworthy supplier for lots of worldwide consumers for Copper Nickel Titanium Cuniti Alloy Sputtering Target , Metallurgical Techniques , Si Sputtering Target , If you are interested in our products, please feel free to send us your inquiry. We sincerely hope to establish win-win business relationships with you.
PriceList for Magnesium Fluoride Mgf2 Sputtering Target - Aluminum – Rich Detail:

Aluminum a lightweight silvery white metal with symbol Al and atomic number 13. It is soft, ductile, corrosion resistant and has a high electrical conductivity.

When the surface of aluminum is exposed to air, a protective oxide coating would form almost instantaneously. This oxide layer is corrosion resistant and can be further enhanced with surface treatments such as anodizing. Aluminum is an excellent thermal and electric conductor. Aluminum is one of the lightest engineering, the conductivity of aluminum is around twice that of copper by weight, which is the first consideration in its use as large power transmission lines, electrical conduction applications including domestic wiring, overhead and high voltage power lines.

Aluminum sputtering target is widely used in the formation of thin films for semiconductors, capacitors, decorations, integrated circuit, and flat panel display. Aluminum targets would be the first candidates if the demand could be satisfied for its cost-saving advantage.

Symbol Al
Relative Molecular Mass 26.98 Latent Heat of Vaporization 11.4J
Atomic Volume 9.996*10-6 Vapor Tension 660/10-8-10-9
Crystalline FCC Conductivity 37.67S/m
Bulk Density 74% Resistance Coefficient +0.115
Coordination Number 12 Absorption Spectrum 0.20*10-24
Lattice Energy 200*10-7 Poisson’s Ratio 0.35
Density 2.7g/cm3 Compressibility 13.3mm2/MN
Elastic Modulus 66.6Gpa Melting Point 660.2
Shear Modulus 25.5Gpa Boiling Point 2500

Rich Special Materials is a Manufacturer of Sputtering Target and could produce high purity Aluminum Sputtering Materials with purity up to 6N according to Customers’ specifications. For more information, please contact us.


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