Welcome to our websites!

Popular Design for Copper Indium Gallium Sputtering Target - AlTi alloy Sputtering Target High Purity – Rich

Short Description:


Product Detail

Product Tags

Related Video

Feedback (2)

We persist with the principle of "quality 1st, assistance initially, continual improvement and innovation to meet the customers" for your management and "zero defect, zero complaints" as the standard objective. To great our service, we present the products and solutions while using the very good top quality at the reasonable cost for Niv Sputtering Target , W Sputtering Target , Antimony Sb Sputtering Target , If you are interested in any of our products, please feel free to contact us for more details. We hope to cooperate with more friends from all over the world.
Popular Design for Copper Indium Gallium Sputtering Target - AlTi alloy Sputtering Target High Purity – Rich Detail:

The requirement of the target quality for sputter coating is higher than that of the traditional materials industry. The uniform microstructure of the target directly affects the sputtering performance. We have a completed quality management system and we select high purity raw materials and thoroughly blend them to ensure homogeneity. Aluminum Titanium alloy sputtering target is produced by means of vacuum hot pressing method.

Our Aluminum Titanium sputtering targets could provide an outstanding oxidation-resistant nitride coating, Titanium aluminum nitride (TiAlN). TiAlN is the current mainstream as a film for cutting tools, sliding parts and tribo-coatings. It has high hardness, toughness, wear resistant performance and oxidation temperature.

Our typical AlTi targets and their properties

Ti-75Al at%

Ti-70Al at%

Ti-67Al at%

Ti-60Al at%

Ti-50Al at%

Ti-30Al at%

Ti-20Al at%

Ti-14Al at%

Purity (%)

99.7

99.7

99.7

99.7

99.8/99.9

99.9

99.9

99.9

Density(g/cm3

3.1

3.2

3.3

3.4

3.63/3.85

3.97

4.25

4.3

Grain Size(µm)

100

100

100

100

100/-

-

-

-

Process

HIP

HIP

HIP

HIP

HIP/VAR

VAR

VAR

VAR

Rich Special Materials specializes in the Manufacture of Sputtering Target and could produce Aluminum Titanium Sputtering Materials according to Customers’ specifications. We could supply a variety of geometric forms: tubes, arc cathodes, planar or custom-made, and wide proportion range of Aluminum. Our products feature excellent mechanical properties, homogeneous microstructure, polished surface with no segregation, pores or cracks. For more information, please contact us.


Product detail pictures:

Popular Design for Copper Indium Gallium Sputtering Target - AlTi alloy Sputtering Target High Purity  – Rich detail pictures


Related Product Guide:

Our focus on should be to consolidate and enhance the quality and repair of present products, in the meantime constantly establish new products to meet unique customers' requires for Popular Design for Copper Indium Gallium Sputtering Target - AlTi alloy Sputtering Target High Purity – Rich , The product will supply to all over the world, such as: Adelaide, Seattle, Buenos Aires, We follow up the career and aspiration of our elder generation, and we're eager to open up a new prospect in this field, We insist on "Integrity, Profession, Win-win Cooperation", because we have now a strong backup, that are excellent partners with advanced manufacturing lines, abundant technical strength, standard inspection system and good production capacity.
  • The company comply with the contract strict, a very reputable manufacturers, worthy a long-term cooperation.
    5 Stars By Maud from Irish - 2018.12.30 10:21
    The sales person is professional and responsible, warm and polite, we had a pleasant conversation and no language barriers on communication.
    5 Stars By Afra from Southampton - 2018.12.05 13:53