OEM/ODM Manufacturer Boron B Sputtering Target - CoCrW Alloy Sputtering Target High Purity Thin Film Pvd Coating Custom Made – Rich
OEM/ODM Manufacturer Boron B Sputtering Target - CoCrW Alloy Sputtering Target High Purity Thin Film Pvd Coating Custom Made – Rich Detail:
Cobalt Chromium Tungsten sputtering target could produce films with high purity and homogenous microstructure, and could exhibit excellent wear resistant, corrosion resistant and oxidation resistant behavior. Cobalt Chromium Tungsten alloy could be produced into solder wire, hardfacing welding, thermal spraying, spray welding or cast ingot.
Cobalt Chromium Tungsten alloy is extensively used in diesel engine, nuclear power station valve, marine engine, and aircraft. Nowadays, Co-Cr-W target is fabricated by means of vacuum melting and vacuum casting. It could be used as deposition source for high-temperature applications such as gas-turbine vanes and buckets.
Rich Special Materials specializes in the Manufacture of Sputtering Target and could produce Cobalt Chromium Tungsten Sputtering Materials according to Customers’ specifications. For more information, please contact us.
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