OEM/ODM Factory Boron Sputtering Target - Crsi Alloy Sputtering Target High Purity Thin Film Pvd Coating Custom Made – Rich
OEM/ODM Factory Boron Sputtering Target - Crsi Alloy Sputtering Target High Purity Thin Film Pvd Coating Custom Made – Rich Detail:
The fabrication of Chronium Silicon Sputtering Targets comprises the following steps:
1.Vacuum melting of Silicon and Chronium to obtain step alloys.
2.Powder grinding, packed and evacuation.
3.Hot isostatic pressing treatment to get semi-finished products.
4.Machining the rough chromium-silicon alloy sputtering target material to obtain the chromium-silicon alloy sputtering target material.
CrSi is often used as the high resistance film material, it features the high resistance, stability and low temperature coefficient of resistance. Chronium and Silicon could produce many silicide phases like Cr3Si , Cr5Si3, , CrSi , CrSi2. The production process, composition and Heat treatment process of the CrSi film greatly affects its performance.
Rich Special Materials specializes in the Manufacture of Sputtering Target and could produce Chronium Silicon Sputtering Materials according to Customers’ specifications. For more information, please contact us.
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We've numerous great employees customers excellent at promoting, QC, and working with kinds of troublesome difficulty inside the generation method for OEM/ODM Factory Boron Sputtering Target - Crsi Alloy Sputtering Target High Purity Thin Film Pvd Coating Custom Made – Rich , The product will supply to all over the world, such as: Slovakia, New Delhi, Bolivia, Our company insists on the purpose of "takes service priority for standard, quality guarantee for the brand, do business in good faith, to offer skilled, rapid, accurate and timely service for you". We welcome old and new customers to negotiate with us. We are going to serve you with all sincerity!
By Brook from Jordan - 2018.10.09 19:07
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By Roberta from Swansea - 2018.06.30 17:29