OEM/ODM Factory Boron Sputtering Target - Crsi Alloy Sputtering Target High Purity Thin Film Pvd Coating Custom Made – Rich
OEM/ODM Factory Boron Sputtering Target - Crsi Alloy Sputtering Target High Purity Thin Film Pvd Coating Custom Made – Rich Detail:
The fabrication of Chronium Silicon Sputtering Targets comprises the following steps:
1.Vacuum melting of Silicon and Chronium to obtain step alloys.
2.Powder grinding, packed and evacuation.
3.Hot isostatic pressing treatment to get semi-finished products.
4.Machining the rough chromium-silicon alloy sputtering target material to obtain the chromium-silicon alloy sputtering target material.
CrSi is often used as the high resistance film material, it features the high resistance, stability and low temperature coefficient of resistance. Chronium and Silicon could produce many silicide phases like Cr3Si , Cr5Si3, , CrSi , CrSi2. The production process, composition and Heat treatment process of the CrSi film greatly affects its performance.
Rich Special Materials specializes in the Manufacture of Sputtering Target and could produce Chronium Silicon Sputtering Materials according to Customers’ specifications. For more information, please contact us.
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Good quality comes 1st; assistance is foremost; business enterprise is cooperation" is our business enterprise philosophy which is regularly observed and pursued by our company for OEM/ODM Factory Boron Sputtering Target - Crsi Alloy Sputtering Target High Purity Thin Film Pvd Coating Custom Made – Rich , The product will supply to all over the world, such as: Saudi Arabia, Jakarta, Malta, Our mission is "Provide Goods with Reliable Quality and Reasonable Prices". We welcome customers from every corner of the world to contact us for future business relationships and achieving mutual success!
The factory has advanced equipment, experienced staffs and good management level, so product quality had assurance, this cooperation is very relaxed and happy!








