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MoNi Sputtering Target High Purity Thin Film Pvd Coating Custom Made

Molybdenum Nickel

Short Description:

Category

Alloy Sputtering Target

Chemical Formula

MoNi

Composition

Molybdenum Nickel

Purity

99.9%,99.95%,99.99%

Shape

Plates,Column Targets,arc cathodes,Custom-made

Production Process

PM

Available Size

L≤2000mm,W≤200mm


Product Detail

Product Tags

Molybdenum Nickel Sputtering Target is fabricated by Vacuum Melting and PM, and it has the advantages of Molybdenum alloy, Molybdenum and Nickel. It has excellent corrosion resistance behavior especially to hydrochloric acid, and good resistance to medium concentration sulphuric acid solutions. It could also be used in Acetic and phosphoric acid environment. We could supply Molybdenum Nickel Sputtering Target with high purity, fine grain size and good performance.

Rich Special Materials specializes in the Manufacture of Sputtering Target and could produce Molybdenum Nickel Sputtering Materials according to Customers’ specifications. For more information, please contact us.


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