Wholesale Low MOQ for Silicon Si Sputtering Target - CoCrAlY Alloy Sputtering Target High Purity Thin Film PVD Coating Custom Made – Rich Manufacturer and Supplier

Low MOQ for Silicon Si Sputtering Target - CoCrAlY Alloy Sputtering Target High Purity Thin Film PVD Coating Custom Made – Rich Featured Image

Short Description:

Product Detail

Product Tags

Feedback (2)

Sticking for the perception of "Creating goods of high quality and making good friends with people today from all around the world", we constantly set the interest of shoppers to begin with for Cobalt Tantalum Zirconium Cotazr Sputtering Target , Fesi Sputtering Target , Molybdenum Sputtering Target , We always regard the technology and customers as the uppermost. We always work hard to create great values for our customers and offer our customers better products & services.

Low MOQ for Silicon Si Sputtering Target - CoCrAlY Alloy Sputtering Target High Purity Thin Film PVD Coating Custom Made – Rich Detail:

Cobalt Chromium Aluminum Yttrium Sputtering Target Description

Cobalt Chromium Aluminum Yttrium sputtering target is a Cobalt-based alloy with addition of Chromium Aluminum and Yttrium elements. It exhibits great corrosion resistant behavior in fused salt medium (sodium sulfate, sodium nitrate, sodium carbonate, calcium sulfate, calcium sulfate, sodium chloride potassium chloride, sodium chloride sodium sulfate) at elevated temperatures. Chromium Aluminum Yttrium could have different ratios, depending on the operational environment of the layers. Usually, the alloy would display biphasic structure while the content of Chromium is 20-40%（wt, Aluminum 5-20%(wt), and Yttrium 0.5%(wt).

Cobalt Chromium Aluminum Yttrium targets could be deposited on the surface of high temperature components used in aerospace, aircraft, and gas turbine industries. This kind of layer could prolong the service life by ten thousand hours.

Cobalt Chromium Aluminum Yttrium Sputtering Target Packaging

Our CoCrAlY sputter target is clearly tagged and labeled externally to ensure efficient identification and quality control. Great care is taken to avoid any damage which might be caused during storage or transportation.

Get Contact

RSM’s Cobalt Chromium Aluminum Yttrium sputtering targets are of ultra-high purity and uniform. They are available in various forms, purities, sizes, and prices. We specialize in producing high purity thin film coating materials with excellent performance as well as the highest possible density and smallest possible average grain sizes for use in mold coating、decoration、automobile parts、low-E glass、semi-conductor integrated circuit、thin film resistance、graphic display、aerospace、 magnetic recording、touch screen、thin film solar battery and other physical vapor deposition (PVD) applications. Please send us an inquiry for current pricing on sputtering targets and other deposition materials not listed.

Product detail pictures:

Related Product Guide:

We'll make every effort and hard work being outstanding and excellent, and speed up our techniques for standing during the rank of global top-grade and high-tech enterprises for Low MOQ for Silicon Si Sputtering Target - CoCrAlY Alloy Sputtering Target High Purity Thin Film PVD Coating Custom Made – Rich , The product will supply to all over the world, such as: Liberia, Moldova, New Delhi, We offer the great variety of products in this field. Besides, customized orders are also available. What's more, you will enjoy our excellent services. In one word, your satisfaction is guaranteed. Welcome to visit our company! For more information, please come to our website.If any further inquiries, please feel free to contact us.

Fesi Sputtering Target

High Temperature Alloys

Mgf2 Sputtering Target

Nb Sputtering Target

Thin Film Material

Vanadium Sputtering Target

The supplier abide the theory of "quality the basic, trust the first and management the advanced" so that they can ensure a reliable product quality and stable customers.