Wholesale High Quality Zno Sputtering Target - CrSi Alloy Sputtering Target High Purity Thin Film Pvd Coating Custom Made – Rich Manufacturer and Supplier

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High Quality Zno Sputtering Target - CrSi Alloy Sputtering Target High Purity Thin Film Pvd Coating Custom Made – Rich Detail:

The fabrication of Chronium Silicon Sputtering Targets comprises the following steps:
1.Vacuum melting of Silicon and Chronium to obtain step alloys.
2.Powder grinding, packed and evacuation.
3.Hot isostatic pressing treatment to get semi-finished products.
4.Machining the rough chromium-silicon alloy sputtering target material to obtain the chromium-silicon alloy sputtering target material.

CrSi is often used as the high resistance film material, it features the high resistance, stability and low temperature coefficient of resistance. Chronium and Silicon could produce many silicide phases like Cr3Si , Cr5Si3, , CrSi , CrSi2. The production process, composition and Heat treatment process of the CrSi film greatly affects its performance.

Rich Special Materials specializes in the Manufacture of Sputtering Target and could produce Chronium Silicon Sputtering Materials according to Customers’ specifications. For more information, please contact us.

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Our items are commonly identified and trusted by people and can fulfill repeatedly altering economic and social wants of High Quality Zno Sputtering Target - CrSi Alloy Sputtering Target High Purity Thin Film Pvd Coating Custom Made – Rich , The product will supply to all over the world, such as: London, Rome, Sacramento, "Make the women more attractive "is our sales philosophy. "Being customers' trusted and preferred brand supplier" is the goal of our company. We are strict with every part of our work. We sincerely welcome friends to negotiate business and start cooperation. We hope to join hands with friends in different industries to create a brilliant future.

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