High Quality Zno Sputtering Target - CrSi Alloy Sputtering Target High Purity Thin Film Pvd Coating Custom Made – Rich
High Quality Zno Sputtering Target - CrSi Alloy Sputtering Target High Purity Thin Film Pvd Coating Custom Made – Rich Detail:
The fabrication of Chronium Silicon Sputtering Targets comprises the following steps:
1.Vacuum melting of Silicon and Chronium to obtain step alloys.
2.Powder grinding, packed and evacuation.
3.Hot isostatic pressing treatment to get semi-finished products.
4.Machining the rough chromium-silicon alloy sputtering target material to obtain the chromium-silicon alloy sputtering target material.
CrSi is often used as the high resistance film material, it features the high resistance, stability and low temperature coefficient of resistance. Chronium and Silicon could produce many silicide phases like Cr3Si , Cr5Si3, , CrSi , CrSi2. The production process, composition and Heat treatment process of the CrSi film greatly affects its performance.
Rich Special Materials specializes in the Manufacture of Sputtering Target and could produce Chronium Silicon Sputtering Materials according to Customers’ specifications. For more information, please contact us.
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From the past few years, our firm absorbed and digested sophisticated technologies equally at home and abroad. Meanwhile, our organization staffs a group of experts devoted into the growth of High Quality Zno Sputtering Target - CrSi Alloy Sputtering Target High Purity Thin Film Pvd Coating Custom Made – Rich , The product will supply to all over the world, such as: Riyadh, Moscow, Muscat, To create more creative products, maintain high-quality products and update not only our products but ourselves so as to keep us ahead of the world, and the last but most vital one: to make every client satisfied with everything we offer and to grow stronger together. To be the real winner, starts here!
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