Wholesale Good Quality Sputtering Thin Film Target Materials - Alta Sputtering Target High Purity Thin Film PVD Coating Custom Made – Rich Manufacturer and Supplier

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We insist on offering premium quality manufacturing with superior business concept, honest product sales as well as finest and fast assistance. it will bring you not only the good quality product or service and huge profit, but the most significant is to occupy the endless market for In Bar , Molybdenum Pellets , Zinc Zn Sputtering Target , To benefit from our strong OEM/ODM capabilities and considerate services, please contact us today. We will sincerely create and share success with all clients.

Good Quality Sputtering Thin Film Target Materials - Alta Sputtering Target High Purity Thin Film PVD Coating Custom Made – Rich Detail:

The targets are prepared by blending Aluminum and Tantalum powders or vacuum melting followed by compaction to full density. The thus compacted materials are optionally sintered and are then formed into the desired target shape.

Aluminum Tantalum sputtering target has high purity, homogeneous microstructure and excellent conductivity. It is widely used in the formation of thin films for flat panel display industry. Aluminum Tantalum could also be added to produce high performance Titanium alloy to improve its high-temperature suitability.

Impurity content of Al-Ta alloy

composition	Content（%）
	Ta	Fe	Si	C	O
AlTa60	55.0~65.0	≤0.05	≤0.02	≤0.01	≤0.05
AlTa70	65.0~75.0	≤0.05	≤0.02	≤0.01	≤0.05

Rich Special Materials specializes in the Manufacture of Sputtering Target and could produce Aluminum Tantalum Sputtering Materials according to Customers’ specifications. Our products feature excellent mechanical properties, homogeneous structure, polished surface with no segregation, pores or cracks. For more information, please contact us.

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