OEM China Copper Cu Sputtering Target - Cralw Alloy Sputtering Target High Purity Thin Film Pvd Coating Custom Made – Rich
OEM China Copper Cu Sputtering Target - Cralw Alloy Sputtering Target High Purity Thin Film Pvd Coating Custom Made – Rich Detail:
Chrome Aluminum Tungsten sputtering target is fabricated by means of powder metallurgy to achieve high purity, homogeneous microstructure, high density and high electrical conductivity.
Chrome Aluminum Tungsten alloy is a perfect material for Interconnects and electrodes industries. It has smooth surface, high deposition rate, toughness, dielectric strength, and could be well blend with the substrate material.
Rich Special Materials specializes in the Manufacture of Sputtering Target and could produce Chronium Aluminum Tungsten Sputtering Materials according to Customers’ specifications. Our products feature high purity, homogeneous structure, high density with no segregation, pores or cracks. For more information, please contact us.
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To constantly improve the management system by virtue of the rule of "sincerely, good faith and quality are the base of enterprise development", we widely absorb the essence of related products internationally, and constantly develop new products to meet the demands of customers for OEM China Copper Cu Sputtering Target - Cralw Alloy Sputtering Target High Purity Thin Film Pvd Coating Custom Made – Rich , The product will supply to all over the world, such as: Russia, Hungary, Serbia, Our company warmly invites domestic and overseas customers to come and negotiate business with us. Let us join hands to create a brilliant tomorrow! We are looking forward to cooperating with you sincerely to achieve a win-win situation. We promise to try our best to provide you with high quality and efficient services.
The company comply with the contract strict, a very reputable manufacturers, worthy a long-term cooperation.










