OEM China Copper Cu Sputtering Target - Cralw Alloy Sputtering Target High Purity Thin Film Pvd Coating Custom Made – Rich
OEM China Copper Cu Sputtering Target - Cralw Alloy Sputtering Target High Purity Thin Film Pvd Coating Custom Made – Rich Detail:
Chrome Aluminum Tungsten sputtering target is fabricated by means of powder metallurgy to achieve high purity, homogeneous microstructure, high density and high electrical conductivity.
Chrome Aluminum Tungsten alloy is a perfect material for Interconnects and electrodes industries. It has smooth surface, high deposition rate, toughness, dielectric strength, and could be well blend with the substrate material.
Rich Special Materials specializes in the Manufacture of Sputtering Target and could produce Chronium Aluminum Tungsten Sputtering Materials according to Customers’ specifications. Our products feature high purity, homogeneous structure, high density with no segregation, pores or cracks. For more information, please contact us.
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"Sincerity, Innovation, Rigorousness, and Efficiency" is the persistent conception of our company for the long-term to develop together with customers for mutual reciprocity and mutual benefit for OEM China Copper Cu Sputtering Target - Cralw Alloy Sputtering Target High Purity Thin Film Pvd Coating Custom Made – Rich , The product will supply to all over the world, such as: Las Vegas, Qatar, Costa Rica, We are eager to cooperate with foreign companies which care much on the real quality, stable supply, strong capability and good service. We can offer the most competitive price with high quality,because we are much MORE PROFESSIONAL. You are welcomed to visit our company at any time.
It can be said that this is a best producer we encountered in China in this industry, we feel lucky to work with so excellent manufacturer.










