Wholesale Good quality Low Melting Point Alloy - Fecota Sputtering Target High Purity Thin Film Pvd Coating Custom Made – Rich Manufacturer and Supplier

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To meet the customers' over-expected gratification , we have our robust crew to offer our best over-all support which includes marketing, income, coming up with, production, excellent managing, packing, warehousing and logistics for Sputter , Te Sputtering Target , Nickel Tungsten Sputtering Target , our merchandise have superior popularity from the whole world as its most competive cost and our most advantage of after-sale assistance for the clients。

Good quality Low Melting Point Alloy - Fecota Sputtering Target High Purity Thin Film Pvd Coating Custom Made – Rich Detail:

Iron Cobalt Tantalum targets are usually available in circular shape and critical thin film materials of vertical magnetic recording media. The considerable amount of Tantalum present in the alloy would result in segregation and present undissolved particles. We employ unique production method which could ensure the homogeneity of the microstructure and improve the mechanical properties of the materials.

Product name		FeCoTa
Fe/wt%		Balance	Balance	Balance
Co/wt%		21.6±0.5	21.9±0.5	20.2±0.5
Ta/wt%		41.1±0.8	39.4±0.8	44.3±0.8
Metal impurity content（ppm）	Ni	≤100	≤100	≤100
	Al	≤300	≤300	≤300
	Si	≤200	≤200	≤200
Gas impurity content（ppm）	C	≤200	≤200	≤200
	N	≤100	≤100	≤100
	O	≤600	≤600	≤600
	S	≤75	≤75	≤75

Rich Special Materials specializes in the Manufacture of Sputtering Target and could produce Iron Cobalt Tantalum Sputtering Materials according to Customers’ specifications. For more information, please contact us.

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