Wholesale Factory supplied Tungsten Silicide Wsi2 Sputtering Target - Tial Sputtering Target High Purity Thin Film Pvd Coating Custom Made – Rich Manufacturer and Supplier

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Factory supplied Tungsten Silicide Wsi2 Sputtering Target - Tial Sputtering Target High Purity Thin Film Pvd Coating Custom Made – Rich Detail:

Titanium Aluminum Sputtering Target Description

The requirement of the target quality for sputter coating is higher than that of the traditional materials industry. The uniform microstructure of the target directly affects the sputtering performance. We have a completed quality management system and we select high purity raw materials and thoroughly blend them to ensure homogeneity. Titanium Aluminum alloy sputtering target is produced by means of vacuum hot pressing method.

Our Titanium Aluminum sputtering targets could provide an outstanding oxidation-resistant nitride coating, Titanium aluminum nitride (TiAlN). TiAlN is the current mainstream as a film for cutting tools, sliding parts and tribo-coatings. It has high hardness, toughness, wear resistant performance and oxidation temperature.

Our typical TiAl targets and their properties

	Ti-75Al at%	Ti-70Al at%	Ti-67Al at%	Ti-60Al at%	Ti-50Al at%	Ti-30Al at%	Ti-20Al at%	Ti-14Al at%
Purity (%)	99.7	99.7	99.7	99.7	99.8/99.9	99.9	99.9	99.9
Density（g/cm³）	3.1	3.2	3.3	3.4	3.63/3.85	3.97	4.25	4.3
Grain Size(µm)	100	100	100	100	100/-	-	-	-
Process	HIP	HIP	HIP	HIP	HIP/VAR	VAR	VAR	VAR

Titanium Aluminum Sputtering Target Packaging

Our Titanium Aluminum sputter target is clearly tagged and labeled externally to ensure efficient identification and quality control. Great care is taken to avoid any damage which might be caused during storage or transportation.

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RSM’s Titanium Aluminum sputtering targets are of ultra-high purity and uniform. They are available in various forms, purities, sizes, and prices.
We could supply a variety of geometric forms: tubes, arc cathodes, planar or custom-made, and wide proportion range of Aluminum. Our products feature excellent mechanical properties, homogeneous microstructure, polished surface with no segregation, pores, or cracks.
We specialize in producing high purity thin film coating materials with excellent performance as well as the highest possible density and smallest possible average grain sizes for use in mold coating、decoration、automobile parts、low-E glass、semi-conductor integrated circuit、thin film resistance、graphic display、aerospace、 magnetic recording、touch screen、thin film solar battery and other physical vapor deposition (PVD) applications. Please send us an inquiry for current pricing on sputtering targets and other deposition materials not listed.

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We provide fantastic energy in top quality and advancement,merchandising,gross sales and marketing and operation for Factory supplied Tungsten Silicide Wsi2 Sputtering Target - Tial Sputtering Target High Purity Thin Film Pvd Coating Custom Made – Rich , The product will supply to all over the world, such as: Ukraine, Iceland, Georgia, Our company has a skillful sales team, strong economic foundation, great technical force, advanced equipment, complete testing means, and excellent after-sales services. Our items have beautiful appearance, fine workmanship and superior quality and win the unanimous approvals of the customers all over the world.

Evaporative Crucible Material