Wholesale China wholesale Sputtering Target - TiAl Sputtering Target High Purity Thin Film Pvd Coating Custom Made – Rich Manufacturer and Supplier

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With this motto in mind, we have become one of the most technologically innovative, cost-efficient, and price-competitive manufacturers for High Quality Elemental Materials , Deposition Materials , Zr Sputtering Target , Being a young increasing organization, we might not the best, but we have been trying our best for being your very good partner.

China wholesale Sputtering Target - TiAl Sputtering Target High Purity Thin Film Pvd Coating Custom Made – Rich Detail:

Titanium Aluminum Sputtering Target Description

The requirement of the target quality for sputter coating is higher than that of the traditional materials industry. The uniform microstructure of the target directly affects the sputtering performance. We have a completed quality management system and we select high purity raw materials and thoroughly blend them to ensure homogeneity. Titanium Aluminum alloy sputtering target is produced by means of vacuum hot pressing method.

Our Titanium Aluminum sputtering targets could provide an outstanding oxidation-resistant nitride coating, Titanium aluminum nitride (TiAlN). TiAlN is the current mainstream as a film for cutting tools, sliding parts and tribo-coatings. It has high hardness, toughness, wear resistant performance and oxidation temperature.

Our typical TiAl targets and their properties

	Ti-75Al at%	Ti-70Al at%	Ti-67Al at%	Ti-60Al at%	Ti-50Al at%	Ti-30Al at%	Ti-20Al at%	Ti-14Al at%
Purity (%)	99.7	99.7	99.7	99.7	99.8/99.9	99.9	99.9	99.9
Density（g/cm³）	3.1	3.2	3.3	3.4	3.63/3.85	3.97	4.25	4.3
Grain Size(µm)	100	100	100	100	100/-	-	-	-
Process	HIP	HIP	HIP	HIP	HIP/VAR	VAR	VAR	VAR

Titanium Aluminum Sputtering Target Packaging

Our Titanium Aluminum sputter target is clearly tagged and labeled externally to ensure efficient identification and quality control. Great care is taken to avoid any damage which might be caused during storage or transportation.

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RSM’s Titanium Aluminum sputtering targets are of ultra-high purity and uniform. They are available in various forms, purities, sizes, and prices.
We could supply a variety of geometric forms: tubes, arc cathodes, planar or custom-made, and wide proportion range of Aluminum. Our products feature excellent mechanical properties, homogeneous microstructure, polished surface with no segregation, pores, or cracks.
We specialize in producing high purity thin film coating materials with excellent performance as well as the highest possible density and smallest possible average grain sizes for use in mold coating、decoration、automobile parts、low-E glass、semi-conductor integrated circuit、thin film resistance、graphic display、aerospace、 magnetic recording、touch screen、thin film solar battery and other physical vapor deposition (PVD) applications. Please send us an inquiry for current pricing on sputtering targets and other deposition materials not listed.

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Our corporation puts emphasis about the administration, the introduction of talented staff, plus the construction of team building, attempting hard to improve the quality and liability consciousness of team members. Our organization successfully attained IS9001 Certification and European CE Certification of China wholesale Sputtering Target - TiAl Sputtering Target High Purity Thin Film Pvd Coating Custom Made – Rich , The product will supply to all over the world, such as: Mexico, Moldova, Chile, We maintain long-term efforts and self-criticism, which helps us and improvement constantly. We strive to improve customer efficiency to save costs for customers. We do our best to improve the quality of product. We will not live up to the historic opportunity of the times.

Al/Cr Sputtering Targets