Wholesale factory Outlets for Cobalt Chromium Tungsten Sputtering Target - AlCr Alloy Sputtering Target High Purity Thin Film Pvd Coating Custom Made – Rich Manufacturer and Supplier

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Our concentrate on should be to consolidate and enhance the quality and service of present products, meanwhile consistently produce new products to meet unique customers' demands for Nickel Chronium Aluminum Yttrium Nicraly Sputtering Target , Titanium Ti Sputtering Target , Bismuth Bi Sputtering Target , All prices depend upon the quantity of your respective order; the extra you purchase, the extra economical the rate is. We also offer fantastic OEM provider to numerous famous brands.

factory Outlets for Cobalt Chromium Tungsten Sputtering Target - AlCr Alloy Sputtering Target High Purity Thin Film Pvd Coating Custom Made – Rich Detail:

Aluminum Chromium Sputtering Target Description

Aluminum chromium sputtering target from Rich Special Materials is an alloy sputtering material containing Al and Cr. Thus, the Aluminum chromium sputter target has the advantages of these two elements.

Aluminum, also called aluminum, is a chemical element that originated from the Latin name for alum, ‘alumen’ meaningbitter salt. It was first mentioned in 1825 and observed by H.C.Ã˜rsted. The isolation was later accomplished and announced by H.C.Ã˜rsted. “Al” is the canonical chemical symbol of aluminum. Its atomic number in the periodic table of elements is 13 with a location at Period 3 and Group 13, belonging to the p-block. The relative atomic mass of aluminum is 26.9815386(8) Dalton, the number in the brackets indicating the uncertainty.

Chromium is a chemical element that originated from the Greek ‘chroma’, meaning colour. It was early used before 1 AD and discovered by Terracotta Army. “Cr” is the canonical chemical symbol of chromium. Its atomic number in the periodic table of elements is 24 with a location at Period 4 and Group 6, belonging to the d-block. The relative atomic mass of chromium is 51.9961(6) Dalton, the number in the brackets indicating the uncertainty.

Our typical AlCr targets and their properties

	Cr-70Al at%	Cr-60Al at%	Cr-50Al at%
Purity (%)	99.8/99.9/99.95	99.8/99.9/99.95	99.8/99.9/99.95
Density（g/cm³）	3.7	4.35	4.55
Grain Size(µm)	100/50	100/50	100/50
Process	HIP	HIP	HIP

Rich Special Materials specializes in the Manufacture of Sputtering Target and could produce Chronium Aluminum Silicon Sputtering Materials according to Customers’ specifications. Our products feature excellent mechanical properties, homogeneous structure, polished surface with no segregation, pores or cracks. For more information, please contact us.

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We always continually offer you by far the most conscientious customer service, and the widest variety of designs and styles with finest materials. These attempts include the availability of customized designs with speed and dispatch for factory Outlets for Cobalt Chromium Tungsten Sputtering Target - AlCr Alloy Sputtering Target High Purity Thin Film Pvd Coating Custom Made – Rich , The product will supply to all over the world, such as: Bahamas, Slovakia, Algeria, Our company has always insisted on the business principle of "Quality, Honest, and Customer First" by which we have won the trust of clients both from at home and abroad. If you are interested in our products, please do not hesitate to contact us for further information.

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