Factory supplied Tungsten Silicide Wsi2 Sputtering Target - Alcu Sputtering Target High Purity Thin Film PVD Coating Custom Made – Rich

Aluminum Copper sputtering target is perfect for a number of industries and applications, due to its high hardness, tensile strength and light weight. It has usually 1-3% copper content and has the similar chemical properties with Aluminum. AlCu has high mechanical properties, excellent machinability, and high-temperature suitability, so it could be the suitable material for high performance Aluminum alloy. High purity AlCu alloy sputtering target could be used in a broad range of industrial fields from semiconductor and electronic functional components.

Rich Special Materials specializes in the Manufacture of Sputtering Target and could produce Aluminum Chromium Sputtering Materials according to Customers’ specifications. Our products feature excellent mechanical properties, homogeneous structure, polished surface with no segregation, pores, or cracks. For more information, please contact us.