Wholesale China wholesale Metal Product - Cral Alloy Sputtering Target High Purity Thin Film PVD Coating Custom Made – Rich Manufacturer and Supplier

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"Sincerity, Innovation, Rigorousness, and Efficiency" could be the persistent conception of our organization for your long-term to establish alongside one another with shoppers for mutual reciprocity and mutual benefit for Sn Sputtering Target , Nickel Chronium Aluminum Yttrium Nicraly Sputtering Target , Mg Ingot , We are confident to make great achievements in the future. We are looking forward to becoming one of your most reliable suppliers.

China wholesale Metal Product - Cral Alloy Sputtering Target High Purity Thin Film PVD Coating Custom Made – Rich Detail:

The fabrication of Chromium Aluminum Sputtering Targets comprises the following steps:

1. Powder grinding and mixing.

2. Hot isostatic pressing treatment to get semi-finished products.

3. Machining the rough chromium aluminum alloy sputtering target material to obtain the chromium aluminum alloy sputtering target material.

During the deposition process of CrAl sputtering targets, a hard Aluminium-Chrom-Nitrid (AlCrN) coating is formed. This coating shows high hardness and oxidation resistance properties even at high temperature. The cutters could run at high feeds to increase productivity and raise quality when using CNC machines.

Our typical AlCr targets and their properties

	Cr-70Al at%	Cr-60Al at%	Cr-50Al at%
Purity (%)	99.8/99.9/99.95	99.8/99.9/99.95	99.8/99.9/99.95
Density（g/cm³）	3.7	4.35	4.55
Grain Size(µm)	100/50	100/50	100/50
Process	HIP	HIP	HIP

Rich Special Materials specializes in the Manufacture of Sputtering Target and could produce Chronium Aluminum Sputtering Materials, and other CrAl series(for example:CrAlSi，CrAlTi，CrAlZr, CrAlTa，CrAlW，CrAlY，CrAlCe，etc.) according to Customers’ specifications. Our products feature excellent mechanical properties, homogeneous structure, polished surface with no segregation, pores or cracks. For more information, please contact us.

Our typical AlCr targets and their properties

	Cr-70Al at%	Cr-60Al at%	Cr-50Al at%
Purity (%)	99.8/99.9/99.95	99.8/99.9/99.95	99.8/99.9/99.95
Density（g/cm³）	3.7	4.35	4.55
Grain Size(µm)	100/50	100/50	100/50
Process	HIP	HIP	HIP

Rich Special Materials specializes in the Manufacture of Sputtering Target and could produce Aluminum Chromium Sputtering Materials according to Customers’ specifications. Our products feature excellent mechanical properties, homogeneous structure, polished surface with no segregation, pores or cracks. For more information, please contact us.

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We stay with our company spirit of "Quality, Performance, Innovation and Integrity". We goal to create more value for our clients with our abundant resources, advanced machinery, experienced workers and superb solutions for China wholesale Metal Product - Cral Alloy Sputtering Target High Purity Thin Film PVD Coating Custom Made – Rich , The product will supply to all over the world, such as: Slovak Republic, Latvia, Puerto Rico, because of our company has been persisting in the management idea of "Survival by Quality, Development by Service, Benefit by Reputation" . We fully realize the good credit standing, the high quality products, the reasonable price and the professional services are the reason that the customers choose us to be their long-term business partner.

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