Wholesale China OEM Ti Dioxide Pellets - Alcr Alloy Sputtering Target High Purity Thin Film Pvd Coating Custom Made – Rich Manufacturer and Supplier

China OEM Ti Dioxide Pellets - Alcr Alloy Sputtering Target High Purity Thin Film Pvd Coating Custom Made – Rich Featured Image

Short Description:

Product Detail

Product Tags

Feedback (2)

Every member from our high efficiency sales team values customers' needs and business communication for Physical Vapor Deposition , Aluminum Sputtering Target , Magnetron Sputtering , We welcome new and old customers from all walks of life to contact us for future business relationships and mutual success!

China OEM Ti Dioxide Pellets - Alcr Alloy Sputtering Target High Purity Thin Film Pvd Coating Custom Made – Rich Detail:

Aluminum Chromium Sputtering Target Description

Aluminum chromium sputtering target from Rich Special Materials is an alloy sputtering material containing Al and Cr. Thus, the Aluminum chromium sputter target has the advantages of these two elements.

Aluminum, also called aluminum, is a chemical element that originated from the Latin name for alum, ‘alumen’ meaningbitter salt. It was first mentioned in 1825 and observed by H.C.Ã˜rsted. The isolation was later accomplished and announced by H.C.Ã˜rsted. “Al” is the canonical chemical symbol of aluminum. Its atomic number in the periodic table of elements is 13 with a location at Period 3 and Group 13, belonging to the p-block. The relative atomic mass of aluminum is 26.9815386(8) Dalton, the number in the brackets indicating the uncertainty.

Chromium is a chemical element that originated from the Greek ‘chroma’, meaning colour. It was early used before 1 AD and discovered by Terracotta Army. “Cr” is the canonical chemical symbol of chromium. Its atomic number in the periodic table of elements is 24 with a location at Period 4 and Group 6, belonging to the d-block. The relative atomic mass of chromium is 51.9961(6) Dalton, the number in the brackets indicating the uncertainty.

Our typical AlCr targets and their properties

	Cr-70Al at%	Cr-60Al at%	Cr-50Al at%
Purity (%)	99.8/99.9/99.95	99.8/99.9/99.95	99.8/99.9/99.95
Density（g/cm³）	3.7	4.35	4.55
Grain Size(µm)	100/50	100/50	100/50
Process	HIP	HIP	HIP

Rich Special Materials specializes in the Manufacture of Sputtering Target and could produce Chronium Aluminum Silicon Sputtering Materials according to Customers’ specifications. Our products feature excellent mechanical properties, homogeneous structure, polished surface with no segregation, pores or cracks. For more information, please contact us.

Product detail pictures:

Related Product Guide:

Fast and good quotations, informed advisers to help you choose the correct product that suits all your needs, a short production time, responsible quality control and different services for paying and shipping affairs for China OEM Ti Dioxide Pellets - Alcr Alloy Sputtering Target High Purity Thin Film Pvd Coating Custom Made – Rich , The product will supply to all over the world, such as: Houston, Nepal, Liberia, Customer's satisfaction is always our quest, creating value for customers is always our duty, a long term mutual-beneficial business relationship is what we are doing for. We are an absolutely reliable partner for you in China. Of course, other services, like consulting, can be offered too.

Aluminum-Silicon Sputtering Targets