China Supplier Iron Hafnium Fehf Sputtering Target - CoFeTaZr Alloy Sputtering Target High Purity Thin Film Pvd Coating Custom Made – Rich
China Supplier Iron Hafnium Fehf Sputtering Target - CoFeTaZr Alloy Sputtering Target High Purity Thin Film Pvd Coating Custom Made – Rich Detail:
Cobalt Iron Tantalum Zirconium sputtering target is fabricated by means of vacuum melting. This production process could effectively protect major constituents from oxidation and ensure homogenous microstructure, uniformed grain size and high consistency of the deposited films.
After heat treatment, the PTF of the target could be significantly improved, so it is often used for the soft magnetic layer material in perpendicular magnetic recording layers.
Rich Special Materials specializes in the Manufacture of Sputtering Target and could produce Cobalt Iron Tantalum Zirconium Sputtering Materials according to Customers’ specifications. For more information, please contact us.
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We aim to find out high quality disfigurement in the generation and provide the most effective services to domestic and abroad clients wholeheartedly for China Supplier Iron Hafnium Fehf Sputtering Target - CoFeTaZr Alloy Sputtering Target High Purity Thin Film Pvd Coating Custom Made – Rich , The product will supply to all over the world, such as: Swaziland, Munich, Southampton, With more than 9 years of experience and a professional team, we have exported our products to many countries and regions all over the world. We welcome customers, business associations and friends from all parts of the world to contact us and seek cooperation for mutual benefits.
The manufacturer gave us a big discount under the premise of ensuring the quality of products, thank you very much, we will select this company again.










