2021 China New Design Arc Ion Plating - CoCrTa Alloy Sputtering Target High Purity Thin Film Pvd Coating Custom Made – Rich
2021 China New Design Arc Ion Plating - CoCrTa Alloy Sputtering Target High Purity Thin Film Pvd Coating Custom Made – Rich Detail:
Cobalt Chromium Tantalum sputtering target is manufactured by casting process and vacuum melting. and are then formed into the desired target shape. It has high purity and homogenous microstructure. Co-Cr-Ta used to be the critical material for magnetic recording for its magnetic properties: high coercivity, low noise property and excellent squareness.
Rich Special Materials specializes in the Manufacture of Sputtering Target and could produce Cobalt Chromium Tantalum Sputtering Materials according to Customers’ specifications. For more information, please contact us.
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Our company insists all along the quality policy of "product good quality is base of enterprise survival; buyer fulfillment will be the staring point and ending of an company; persistent improvement is eternal pursuit of staff" and also the consistent purpose of "reputation very first, shopper first" for 2021 China New Design Arc Ion Plating - CoCrTa Alloy Sputtering Target High Purity Thin Film Pvd Coating Custom Made – Rich , The product will supply to all over the world, such as: Manchester, San Francisco, Marseille, Our company sticks to the principle of "high quality, reasonable price and timely delivery". We sincerely hope to establish good cooperative relationships with our new and old business partners from all parts of the world. We hope to work with you and serve you with our excellent goods and services. Welcome to join us!
The goods we received and the sample sales staff display to us have the same quality, it is really a creditable manufacturer.










