2021 China New Design Arc Ion Plating - CoCrTa Alloy Sputtering Target High Purity Thin Film Pvd Coating Custom Made – Rich
2021 China New Design Arc Ion Plating - CoCrTa Alloy Sputtering Target High Purity Thin Film Pvd Coating Custom Made – Rich Detail:
Cobalt Chromium Tantalum sputtering target is manufactured by casting process and vacuum melting. and are then formed into the desired target shape. It has high purity and homogenous microstructure. Co-Cr-Ta used to be the critical material for magnetic recording for its magnetic properties: high coercivity, low noise property and excellent squareness.
Rich Special Materials specializes in the Manufacture of Sputtering Target and could produce Cobalt Chromium Tantalum Sputtering Materials according to Customers’ specifications. For more information, please contact us.
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Attaining consumer satisfaction is our firm's purpose for good. We'll make wonderful efforts to produce new and top-quality merchandise, meet up with your special necessities and supply you with pre-sale, on-sale and after-sale products and services for 2021 China New Design Arc Ion Plating - CoCrTa Alloy Sputtering Target High Purity Thin Film Pvd Coating Custom Made – Rich , The product will supply to all over the world, such as: Iraq, Kenya, Sri Lanka, We have our own registered brand and our company is developing rapidly owing to high quality products, competitive price and excellent service. We sincerely hope to establish business relations with more friends from home and abroad in the near future. We look forward to your correspondence.
The after-sale warranty service is timely and thoughtful, encounter problems can be resolved very quickly, we feel reliable and secure.










