Wholesale 100% Original Factory V Sputtering Target - Cral Alloy Sputtering Target High Purity Thin Film PVD Coating Custom Made – Rich Manufacturer and Supplier

100% Original Factory V Sputtering Target - Cral Alloy Sputtering Target High Purity Thin Film PVD Coating Custom Made – Rich Featured Image

Short Description:

Product Detail

Product Tags

Feedback (2)

Our enterprise aims to operating faithfully, serving to all of our prospects , and working in new technology and new machine frequently for Fecotazr Sputtering Target , Sio2 Pellets , Zno Target , Our company has been devoting that "customer first" and committed to helping customers expand their business, so that they become the Big Boss !

100% Original Factory V Sputtering Target - Cral Alloy Sputtering Target High Purity Thin Film PVD Coating Custom Made – Rich Detail:

The fabrication of Chromium Aluminum Sputtering Targets comprises the following steps:

1. Powder grinding and mixing.

2. Hot isostatic pressing treatment to get semi-finished products.

3. Machining the rough chromium aluminum alloy sputtering target material to obtain the chromium aluminum alloy sputtering target material.

During the deposition process of CrAl sputtering targets, a hard Aluminium-Chrom-Nitrid (AlCrN) coating is formed. This coating shows high hardness and oxidation resistance properties even at high temperature. The cutters could run at high feeds to increase productivity and raise quality when using CNC machines.

Our typical AlCr targets and their properties

	Cr-70Al at%	Cr-60Al at%	Cr-50Al at%
Purity (%)	99.8/99.9/99.95	99.8/99.9/99.95	99.8/99.9/99.95
Density（g/cm³）	3.7	4.35	4.55
Grain Size(µm)	100/50	100/50	100/50
Process	HIP	HIP	HIP

Rich Special Materials specializes in the Manufacture of Sputtering Target and could produce Chronium Aluminum Sputtering Materials, and other CrAl series(for example:CrAlSi，CrAlTi，CrAlZr, CrAlTa，CrAlW，CrAlY，CrAlCe，etc.) according to Customers’ specifications. Our products feature excellent mechanical properties, homogeneous structure, polished surface with no segregation, pores or cracks. For more information, please contact us.

Our typical AlCr targets and their properties

	Cr-70Al at%	Cr-60Al at%	Cr-50Al at%
Purity (%)	99.8/99.9/99.95	99.8/99.9/99.95	99.8/99.9/99.95
Density（g/cm³）	3.7	4.35	4.55
Grain Size(µm)	100/50	100/50	100/50
Process	HIP	HIP	HIP

Rich Special Materials specializes in the Manufacture of Sputtering Target and could produce Aluminum Chromium Sputtering Materials according to Customers’ specifications. Our products feature excellent mechanical properties, homogeneous structure, polished surface with no segregation, pores or cracks. For more information, please contact us.

Product detail pictures:

Related Product Guide:

We're going to commit ourselves to giving our esteemed customers along with the most enthusiastically considerate providers for 100% Original Factory V Sputtering Target - Cral Alloy Sputtering Target High Purity Thin Film PVD Coating Custom Made – Rich , The product will supply to all over the world, such as: Saudi Arabia, Munich, Portugal, As an experienced factory we also accept customized order and make it same as your picture or sample specifying specification and customer design packing. The main goal of the company is to live a satisfactory memory to all the customers,and establish a long term win-win business relationship. For more information,please contact us. And it's our great pleasure if you like to have a personally meeting in our office.

Factory Supply