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100% Original Factory V Sputtering Target - Cral Alloy Sputtering Target High Purity Thin Film PVD Coating Custom Made – Rich

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We usually continually offer you the most conscientious consumer services, along with the widest variety of designs and styles with finest materials. These initiatives include the availability of customized designs with speed and dispatch for Oxide Target , Granules , Molybdenum Pellets , If you are interested in any of our products, please feel free to contact us for more details. We hope to cooperate with more friends from all over the world.
100% Original Factory V Sputtering Target - Cral Alloy Sputtering Target High Purity Thin Film PVD Coating Custom Made – Rich Detail:

The fabrication of Chromium Aluminum Sputtering Targets comprises the following steps:

1.     Powder grinding and mixing.

2.    Hot isostatic pressing treatment to get semi-finished products.

3.    Machining the rough chromium aluminum  alloy sputtering target material to obtain the chromium aluminum alloy sputtering target material.

During the deposition process of CrAl sputtering targets, a hard Aluminium-Chrom-Nitrid (AlCrN) coating is formed. This coating shows high hardness and oxidation resistance properties even at high temperature. The cutters could run at high feeds to increase productivity and raise quality when using CNC machines.

Our typical AlCr targets and their properties

Cr-70Al at%

Cr-60Al at%

Cr-50Al at%

Purity (%)

99.8/99.9/99.95

99.8/99.9/99.95

99.8/99.9/99.95

Density(g/cm3

3.7

4.35

4.55

Grain Size(µm)

100/50

100/50

100/50

Process

HIP

HIP

HIP

Rich Special Materials specializes in the Manufacture of Sputtering Target and could produce Chronium Aluminum Sputtering Materials, and other CrAl series(for example:CrAlSi,CrAlTi,CrAlZr, CrAlTa,CrAlW,CrAlY,CrAlCe,etc.) according to Customers’ specifications. Our products feature excellent mechanical properties, homogeneous structure, polished surface with no segregation, pores or cracks. For more information, please contact us.

Our typical AlCr targets and their properties

Cr-70Al at%

Cr-60Al at%

Cr-50Al at%

Purity (%)

99.8/99.9/99.95

99.8/99.9/99.95

99.8/99.9/99.95

Density(g/cm3

3.7

4.35

4.55

Grain Size(µm)

100/50

100/50

100/50

Process

HIP

HIP

HIP

Rich Special Materials specializes in the Manufacture of Sputtering Target and could produce Aluminum Chromium Sputtering Materials according to Customers’ specifications. Our products feature excellent mechanical properties, homogeneous structure, polished surface with no segregation, pores or cracks. For more information, please contact us.


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100% Original Factory V Sputtering Target - Cral Alloy Sputtering Target High Purity Thin Film PVD Coating Custom Made – Rich detail pictures


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The key to our success is "Good Product Excellent, Reasonable Rate and Efficient Service" for 100% Original Factory V Sputtering Target - Cral Alloy Sputtering Target High Purity Thin Film PVD Coating Custom Made – Rich , The product will supply to all over the world, such as: Canberra, Israel, Sacramento, We've got constructed strong and long co-operation relationship with an enormous quantity of companies within this business in Kenya and overseas. Immediate and professional after-sale service supplied by our consultant group has happy our buyers. Thorough Info and parameters from the merchandise will probably be sent for you for any thorough acknowledge. Free samples may be delivered and company check out to our corporation. n Kenya for negotiation is constantly welcome. Hope to get inquiries type you and construct a long-term co-operation partnership.
  • The customer service staff's answer is very meticulous, the most important is that the product quality is very good, and packaged carefully, shipped quickly!
    5 Stars By Roxanne from Iran - 2018.07.26 16:51
    This is a very professional and honest Chinese supplier, from now on we fell in love with the Chinese manufacturing.
    5 Stars By Flora from Nairobi - 2017.07.28 15:46