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ZrSi Alloy Sputtering Target High Purity Thin Film PVD Coating Custom Made

Zirconium Silicon

Short Description:

Category

Alloy Sputtering Target

Chemical Formula

ZrSi

Composition

Zirconium Silicon

Purity

99.5%,99.7%,99.9%,

Shape

Plates,Column Targets,arc cathodes,Custom-made

Production Process

Vacuum Melting,PM

Available Size

L≤200mm,W≤200mm


Product Detail

Product Tags

ZrSi Alloy Sputtering Target High Purity Thin Film PVD Coating Custom Made,
Zirconium Silicon sputtering target,
Zirconium Silicon sputtering target is fabricated by means of vacuum melting and power metallurgy.

The Zirconium present could improve the hardness and corrosion resistance behavior.

Zirconium Silicon target in low in electric conductivity, and could reduce the residual stress, which would improve the stability of coatings and prolong service life. The coatings could be used on Low-E glass for its high consistency and corrosion resistance behavior.

Compared to pure Silicon, High purity Zirconium Silicon sputtering targets could significantly improve the friction resistance of the deposited coating by 4-6 times.

Therefore, Zr-Si is available for many practical applications.

Rich Special Materials is a Manufacturer of Sputtering Target and could produce Zirconium Silicon Sputtering Materials according to Customers’ specifications. For more information, please contact us.Zirconium Silicon sputtering target is fabricated by means of vacuum melting and power metallurgy.
The Zirconium present could improve the hardness and corrosion resistance behavior.
Zirconium Silicon target in low in electric conductivity, and could reduce the residual stress, which would improve the stability of coatings and prolong service life. The coatings could be used on Low-E glass for its high consistency and corrosion resistance behavior.
Compared to pure Silicon, High purity Zirconium Silicon sputtering targets could significantly improve the friction resistance of the deposited coating by 4-6 times.
ZrSi Sputtering Target Application
ZrSi sputter target is used in many vacuum applications such as automotive glass coatings, photovoltaic cell fabrication, battery fabrication, fuel cell, and decorative and corrosion-resistant coatings. ZrSi sputtering target is used for CD-ROM, thin film deposition decoration, flat panel displays, functional coating as nicely as other optical information storage space industry, etc.
ZrSi Sputtering Target Packaging
Our ZrSi sputter target is clearly tagged and labeled externally to ensure efficient identification and quality control. Great care is taken to avoid any damage which might be caused during storage or transportation.

Get Contact
RSM’s Zirconium Silicon sputtering targets are of ultra-high purity and uniform. They are available in various forms, purities, sizes, and prices. We specialize in producing high purity thin film coating materials with excellent performance as well as the highest possible density and smallest possible average grain sizes for use in mold coating、decoration、automobile parts、low-E glass、semi-conductor integrated circuit、thin film resistance、graphic display、aerospace、 magnetic recording、touch screen、thin film solar battery and other physical vapor deposition (PVD) applications. Please send us an inquiry for current pricing on sputtering targets and other deposition materials not listed.


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