Wholesale Wholesale Discount Reactive Sputtering - Fecota Sputtering Target High Purity Thin Film Pvd Coating Custom Made – Rich Manufacturer and Supplier

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We know that we only thrive if we can easily guarantee our combined cost competiveness and high-quality advantageous at the same time for Cobalt Chromium Tungsten Cocrw Sputtering Target , Al Sputtering Target , Target , We welcome all of the purchasers and pals to contact us for mutual added benefits. Hope to do additional business enterprise along with you.

Wholesale Discount Reactive Sputtering - Fecota Sputtering Target High Purity Thin Film Pvd Coating Custom Made – Rich Detail:

Iron Cobalt Tantalum targets are usually available in circular shape and critical thin film materials of vertical magnetic recording media. The considerable amount of Tantalum present in the alloy would result in segregation and present undissolved particles. We employ unique production method which could ensure the homogeneity of the microstructure and improve the mechanical properties of the materials.

Product name		FeCoTa
Fe/wt%		Balance	Balance	Balance
Co/wt%		21.6±0.5	21.9±0.5	20.2±0.5
Ta/wt%		41.1±0.8	39.4±0.8	44.3±0.8
Metal impurity content（ppm）	Ni	≤100	≤100	≤100
	Al	≤300	≤300	≤300
	Si	≤200	≤200	≤200
Gas impurity content（ppm）	C	≤200	≤200	≤200
	N	≤100	≤100	≤100
	O	≤600	≤600	≤600
	S	≤75	≤75	≤75

Rich Special Materials specializes in the Manufacture of Sputtering Target and could produce Iron Cobalt Tantalum Sputtering Materials according to Customers’ specifications. For more information, please contact us.

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