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Well-designed Titanium Nitride Tin Sputtering Targets - Alcr Alloy Sputtering Target High Purity Thin Film Pvd Coating Custom Made – Rich

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Adhering into the principle of "quality, provider, performance and growth", we now have gained trusts and praises from domestic and intercontinental consumer for Factory Price , Cobalt Pellets , Aluminum-Chromium Al/Cr Sputtering Targets , Base within the small business concept of Top quality initially, we want to fulfill more and additional friends within the word and we hope provide the ideal solution and services to you.
Well-designed Titanium Nitride Tin Sputtering Targets - Alcr Alloy Sputtering Target High Purity Thin Film Pvd Coating Custom Made – Rich Detail:

Aluminum Chromium Sputtering Target Description

Aluminum chromium sputtering target from Rich Special Materials is an alloy sputtering material containing Al and Cr. Thus, the Aluminum chromium sputter target has the advantages of these two elements.

Aluminum, also called aluminum, is a chemical element that originated from the Latin name for alum, ‘alumen’ meaningbitter salt. It was first mentioned in 1825 and observed by H.C.Ørsted. The isolation was later accomplished and announced by H.C.Ørsted. “Al” is the canonical chemical symbol of aluminum. Its atomic number in the periodic table of elements is 13 with a location at Period 3 and Group 13, belonging to the p-block. The relative atomic mass of aluminum is 26.9815386(8) Dalton, the number in the brackets indicating the uncertainty.

Chromium is a chemical element that originated from the Greek ‘chroma’, meaning colour. It was early used before 1 AD and discovered by Terracotta Army. “Cr” is the canonical chemical symbol of chromium. Its atomic number in the periodic table of elements is 24 with a location at Period 4 and Group 6, belonging to the d-block. The relative atomic mass of chromium is 51.9961(6) Dalton, the number in the brackets indicating the uncertainty.

Our typical AlCr targets and their properties

Cr-70Al at%

Cr-60Al at%

Cr-50Al at%

Purity (%)

99.8/99.9/99.95

99.8/99.9/99.95

99.8/99.9/99.95

Density(g/cm3

3.7

4.35

4.55

Grain Size(µm)

100/50

100/50

100/50

Process

HIP

HIP

HIP

Rich Special Materials specializes in the Manufacture of Sputtering Target and could produce Chronium Aluminum Silicon Sputtering Materials according to Customers’ specifications. Our products feature excellent mechanical properties, homogeneous structure, polished surface with no segregation, pores or cracks. For more information, please contact us.


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Well-designed Titanium Nitride Tin Sputtering Targets - Alcr Alloy Sputtering Target High Purity Thin Film Pvd Coating Custom Made – Rich detail pictures


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Normally customer-oriented, and it's our ultimate concentrate on for being not only one of the most dependable, trustable and honest supplier, but also the partner for our shoppers for Well-designed Titanium Nitride Tin Sputtering Targets - Alcr Alloy Sputtering Target High Purity Thin Film Pvd Coating Custom Made – Rich , The product will supply to all over the world, such as: Seychelles, Atlanta, Colombia, Since the establishment of our company, we've realized the importance of providing good quality goods and the best before-sales and after-sales services. Most problems between global suppliers and clients are due to poor communication. Culturally, suppliers can be reluctant to question points they do not understand. We break down these barriers to ensure you get what you want to the level you expect, when you want it.
  • This company has the idea of "better quality, lower processing costs, prices are more reasonable", so they have competitive product quality and price, that's the main reason we chose to cooperate.
    5 Stars By Jason from Dominica - 2017.06.19 13:51
    The customer service reprersentative explained very detailed, service attitude is very good, reply is very timely and comprehensive, a happy communication! We hope to have a opportunity to cooperate.
    5 Stars By Elma from Paris - 2018.02.04 14:13