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Top Suppliers Chromium Cr Sputtering Target - High Purity 99.99% Ni60-Cr 40 wt% Metal Targets Nickel Chromium Alloy Metal target for PVD sputtering target – Rich

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Top Suppliers Chromium Cr Sputtering Target - High Purity 99.99% Ni60-Cr 40 wt% Metal Targets Nickel Chromium Alloy Metal target for PVD sputtering target – Rich Detail:

High Purity 99.99% Ni60-Cr 40 wt% Metal Targets Nickel Chromium Alloy Metal target for PVD sputtering target,
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Chromium cobalt sputtering target from Rich Special Materials is a silvery alloy sputtering material containing Cr and Co.

Chromium

Chromium is a chemical element that originated from the Greek ‘chroma’, meaning color. It was early used before 1 AD and discovered by Terracotta Army. “Cr” is the canonical chemical symbol of chromium. Its atomic number in the periodic table of elements is 24 with a location at Period 4 and Group 6, belonging to the d-block. The relative atomic mass of chromium is 51.9961(6) Dalton, the number in the brackets indicating the uncertainty.

Cobalt

Cobalt is a chemical element that originated from the German word ‘kobald’, meaning goblin. It was first mentioned in 1732 and observed by G. Brandt. “Co” is the canonical chemical symbol of cobalt. Its atomic number in the periodic table of elements is 27 with a location at Period 4 and Group 9, belonging to the d-block. The relative atomic mass of cobalt is 58.933195(5) Dalton, the number in the brackets indicating the uncertainty.

Chronium Cobalt Sputtering Targets are manufactured by means of Vacuum Melting and PM. CrCo has superior specific strength and has been used in various fields where high wear-resistance was needed including aerospace industry, cutlery, bearings, blades, etc.

Rich Special Materials specializes in the Manufacture of Sputtering Target and could produce Chronium Cobalt Sputtering Materials according to Customers’ specifications. For more information, please contact us.Nickel Chronium Target
We accept Customized Composition, Purity and Shape.
Composition: NiCr7 wt%、NiCr10 wt%、NiCr20 wt%、NiCr30 wt%、 NiCr40 at%、NiCr44 wt%、NiCr50 wt%、NiCr60 wt%、NiCrCu、NiCrFe、NiCrCuFe、NiCrAl、NiCrAlY、NiWCr、NiCrAlYHf、NiCrAlYSi、NiCoCrAlY、NiCoCrAlYHfSi、NiCoCrAlYTa…
Purity: 99.5%、99.7%、99.8%、99.9%、99.95%、99.99%.
Shape: Circular, Plane, Tube, Arc, Multi-tile…
Ni-Cr40 wt%
Size: Dia100*45
Shape: Circular, Plane, Tube, Arc, Multi-tile…
Purity: 99.5%
MOQ: 1 Piece
Dispatch: 25 Days
Customization: Available
Application: Glass, Electronic Products…

With its good performance of antioxidation and corrosion resisting, NiCr alloy sputtering target It is extensively used in many industrial applications, such as Low-E glass, micro-electronics, magnetic recording, semiconductor, and thin film resistor.
Nickel Chromium Sputtering Target is widely used in the glass coating industry, including automotive glass coating, in order to reduce the reflection, increase the transmittance of light, and solve the ghost image problem. In addition, PVD coating could slow the rate of aging and extend the useful life of products.
Low-E, or low-emissivity, glass was created to minimize the amount of infrared and ultraviolet light that comes through your glass, without minimizing the amount of light that enters your home. Low-E glass windows have thin coatings that are transparent and reflect heat, keeping the temperature consistent by reflecting the interior temperatures back inside. Nickel Chromium is often deposited outermost to function as antioxidation and corrosion resisting layer.
Thin film resistor produced by Nickel Chromium alloy has many advantages: high Resistivity, low Temperature Coefficient and high Sensitivity, and widely used in different industries including Resistance Strain Gauge.


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Top Suppliers Chromium Cr Sputtering Target - High Purity 99.99% Ni60-Cr 40 wt% Metal Targets Nickel Chromium Alloy Metal target for PVD sputtering target – Rich detail pictures


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  • The factory has advanced equipment, experienced staffs and good management level, so product quality had assurance, this cooperation is very relaxed and happy!
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