Top Suppliers Chromium Cr Sputtering Target - CoFeTaZr Alloy Sputtering Target High Purity Thin Film Pvd Coating Custom Made – Rich
Top Suppliers Chromium Cr Sputtering Target - CoFeTaZr Alloy Sputtering Target High Purity Thin Film Pvd Coating Custom Made – Rich Detail:
Cobalt Iron Tantalum Zirconium sputtering target is fabricated by means of vacuum melting. This production process could effectively protect major constituents from oxidation and ensure homogenous microstructure, uniformed grain size and high consistency of the deposited films.
After heat treatment, the PTF of the target could be significantly improved, so it is often used for the soft magnetic layer material in perpendicular magnetic recording layers.
Rich Special Materials specializes in the Manufacture of Sputtering Target and could produce Cobalt Iron Tantalum Zirconium Sputtering Materials according to Customers’ specifications. For more information, please contact us.
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No matter new customer or old customer, We believe in long term and trusted relationship for Top Suppliers Chromium Cr Sputtering Target - CoFeTaZr Alloy Sputtering Target High Purity Thin Film Pvd Coating Custom Made – Rich , The product will supply to all over the world, such as: Manchester, Bahrain, Indonesia, We insist on "Quality First, Reputation First and Customer First". We are committed to providing high-quality products and good after-sales services. Up to now, our products have been exported to more than 60 countries and areas around the world, such as America, Australia and Europe. We enjoy a high reputation at home and abroad. Always persisting in the principle of "Credit, Customer and Quality", we expect cooperation with people in all walks of life for mutual benefits.
By Mario from Netherlands - 2018.11.22 12:28
Speaking of this cooperation with the Chinese manufacturer, I just want to say"well dodne", we are very satisfied.
By Cora from Philippines - 2018.11.11 19:52