Short Lead Time for Iron Chromium Fecr Sputtering Target - CoNiFe Alloy Sputtering Target High Purity Thin Film Pvd Coating Custom Made – Rich
Short Lead Time for Iron Chromium Fecr Sputtering Target - CoNiFe Alloy Sputtering Target High Purity Thin Film Pvd Coating Custom Made – Rich Detail:
Cobalt Nickel Iron sputtering target is fabricated by means of vacuum melting. It is extensively used as vacuum electronic device, such as firing tube, oscillation tube, ignitron and transistor. It exhibits coefficient of linear expansion similar as hard glass under -80~450℃. Hence it is often used to produce high air-sealed components with hard glass or ceramics. The coatings deposited by Cobalt Nickel Iron targets have excellent soft magnetic properties.
Rich Special Materials is a Manufacturer of Sputtering Target and could produce Cobalt Nickel Iron Sputtering Materials according to Customers’ specifications. For more information, please contact us.
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