Short Lead Time for Iron Chromium Fecr Sputtering Target - Cocrta Alloy Sputtering Target High Purity Thin Film Pvd Coating Custom Made – Rich
Short Lead Time for Iron Chromium Fecr Sputtering Target - Cocrta Alloy Sputtering Target High Purity Thin Film Pvd Coating Custom Made – Rich Detail:
Cobalt Chromium Tantalum sputtering target is manufactured by casting process and vacuum melting. and are then formed into the desired target shape. It has high purity and homogenous microstructure. Co-Cr-Ta used to be the critical material for magnetic recording for its magnetic properties: high coercivity, low noise property and excellent squareness.
Rich Special Materials specializes in the Manufacture of Sputtering Target and could produce Cobalt Chromium Tantalum Sputtering Materials according to Customers’ specifications. For more information, please contact us.
Product detail pictures:
Related Product Guide:
No matter new buyer or old purchaser, We believe in long expression and trusted relationship for Short Lead Time for Iron Chromium Fecr Sputtering Target - Cocrta Alloy Sputtering Target High Purity Thin Film Pvd Coating Custom Made – Rich , The product will supply to all over the world, such as: kazan, Ukraine, Estonia, Today, We are with great passion and sincerity to further fulfill our global customers' needs with good quality and design innovation. We fully welcome customers from all over the world to establish stable and mutually beneficial business relationships, to have a bright future together.
By Ray from Macedonia - 2017.01.28 19:59
We have been engaged in this industry for many years, we appreciate the work attitude and production capacity of the company, this is a reputable and professional manufacturer.
By Jocelyn from Canada - 2018.03.03 13:09
