Short Lead Time for Iron Chromium Fecr Sputtering Target - Almg Alloy Sputtering Target High Purity Thin Film Pvd Coating Custom Made – Rich
Short Lead Time for Iron Chromium Fecr Sputtering Target - Almg Alloy Sputtering Target High Purity Thin Film Pvd Coating Custom Made – Rich Detail:
Aluminium Magnesium alloy sputtering target is fabricated by means of vacuum melting, casting and deformation technique. This material has high strength, thermal radiation, electromagnetic shielding efficiency, and good corrosion resistance, and is widely applicated in the aerospace, solar panel, electronics, data storage, automotive, navigation, renewable energy industries.
Rich Special Materials specializes in the Manufacture of Sputtering Target and could produce Aluminum Magnesium Sputtering Materials according to Customers’ specifications. Our products feature excellent mechanical properties, homogeneous structure, polished surface with no segregation, pores or cracks. For more information, please contact us.
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