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Renewable Design for Nd Sputtering Target - Alcr Alloy Sputtering Target High Purity Thin Film Pvd Coating Custom Made – Rich

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"Sincerity, Innovation, Rigorousness, and Efficiency" is the persistent conception of our firm for the long-term to create jointly with consumers for mutual reciprocity and mutual reward for Indium Bonding , Pt Sputtering Target , Titanium Aluminum Ti/Al Sputtering Target , Are you still seeking for a excellent merchandise that is in accordance together with your fantastic firm image while expanding your solution range? Try our excellent products. Your choice will prove to become intelligent!
Renewable Design for Nd Sputtering Target - Alcr Alloy Sputtering Target High Purity Thin Film Pvd Coating Custom Made – Rich Detail:

Aluminum Chromium Sputtering Target Description

Aluminum chromium sputtering target from Rich Special Materials is an alloy sputtering material containing Al and Cr. Thus, the Aluminum chromium sputter target has the advantages of these two elements.

Aluminum, also called aluminum, is a chemical element that originated from the Latin name for alum, ‘alumen’ meaningbitter salt. It was first mentioned in 1825 and observed by H.C.Ørsted. The isolation was later accomplished and announced by H.C.Ørsted. “Al” is the canonical chemical symbol of aluminum. Its atomic number in the periodic table of elements is 13 with a location at Period 3 and Group 13, belonging to the p-block. The relative atomic mass of aluminum is 26.9815386(8) Dalton, the number in the brackets indicating the uncertainty.

Chromium is a chemical element that originated from the Greek ‘chroma’, meaning colour. It was early used before 1 AD and discovered by Terracotta Army. “Cr” is the canonical chemical symbol of chromium. Its atomic number in the periodic table of elements is 24 with a location at Period 4 and Group 6, belonging to the d-block. The relative atomic mass of chromium is 51.9961(6) Dalton, the number in the brackets indicating the uncertainty.

Our typical AlCr targets and their properties

Cr-70Al at%

Cr-60Al at%

Cr-50Al at%

Purity (%)

99.8/99.9/99.95

99.8/99.9/99.95

99.8/99.9/99.95

Density(g/cm3

3.7

4.35

4.55

Grain Size(µm)

100/50

100/50

100/50

Process

HIP

HIP

HIP

Rich Special Materials specializes in the Manufacture of Sputtering Target and could produce Chronium Aluminum Silicon Sputtering Materials according to Customers’ specifications. Our products feature excellent mechanical properties, homogeneous structure, polished surface with no segregation, pores or cracks. For more information, please contact us.


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We've been committed to offering easy,time-saving and money-saving one-stop purchasing service of consumer for Renewable Design for Nd Sputtering Target - Alcr Alloy Sputtering Target High Purity Thin Film Pvd Coating Custom Made – Rich , The product will supply to all over the world, such as: Swiss, Oslo, Jordan, We've been adhering to the philosophy of "attracting customers with the best items and excellent service". We welcome customers, business associations and friends from all parts of the world to contact us and seek cooperation for mutual benefits.
  • We have worked with many companies, but this time is the best,detailed explanation, timely delivery and quality qualified, nice!
    5 Stars By Mag from Turkmenistan - 2018.06.21 17:11
    It is really lucky to meet such a good supplier, this is our most satisfied cooperation, I think we will work again!
    5 Stars By Edwina from Ukraine - 2017.09.30 16:36