Wholesale Renewable Design for Nd Sputtering Target - Alcr Alloy Sputtering Target High Purity Thin Film Pvd Coating Custom Made – Rich Manufacturer and Supplier

Renewable Design for Nd Sputtering Target - Alcr Alloy Sputtering Target High Purity Thin Film Pvd Coating Custom Made – Rich Featured Image

Short Description:

Product Detail

Product Tags

Feedback (2)

Bear "Customer initially, High-quality first" in mind, we work closely with our prospects and supply them with efficient and specialist companies for Thin Film Materials , Vacuum Coating Materials , Rh Sputtering Target , You should send us your specifications and requirements, or feel totally free to speak to us with any questions or inquiries that you may have.

Renewable Design for Nd Sputtering Target - Alcr Alloy Sputtering Target High Purity Thin Film Pvd Coating Custom Made – Rich Detail:

Aluminum Chromium Sputtering Target Description

Aluminum chromium sputtering target from Rich Special Materials is an alloy sputtering material containing Al and Cr. Thus, the Aluminum chromium sputter target has the advantages of these two elements.

Aluminum, also called aluminum, is a chemical element that originated from the Latin name for alum, ‘alumen’ meaningbitter salt. It was first mentioned in 1825 and observed by H.C.Ã˜rsted. The isolation was later accomplished and announced by H.C.Ã˜rsted. “Al” is the canonical chemical symbol of aluminum. Its atomic number in the periodic table of elements is 13 with a location at Period 3 and Group 13, belonging to the p-block. The relative atomic mass of aluminum is 26.9815386(8) Dalton, the number in the brackets indicating the uncertainty.

Chromium is a chemical element that originated from the Greek ‘chroma’, meaning colour. It was early used before 1 AD and discovered by Terracotta Army. “Cr” is the canonical chemical symbol of chromium. Its atomic number in the periodic table of elements is 24 with a location at Period 4 and Group 6, belonging to the d-block. The relative atomic mass of chromium is 51.9961(6) Dalton, the number in the brackets indicating the uncertainty.

Our typical AlCr targets and their properties

	Cr-70Al at%	Cr-60Al at%	Cr-50Al at%
Purity (%)	99.8/99.9/99.95	99.8/99.9/99.95	99.8/99.9/99.95
Density（g/cm³）	3.7	4.35	4.55
Grain Size(µm)	100/50	100/50	100/50
Process	HIP	HIP	HIP

Rich Special Materials specializes in the Manufacture of Sputtering Target and could produce Chronium Aluminum Silicon Sputtering Materials according to Customers’ specifications. Our products feature excellent mechanical properties, homogeneous structure, polished surface with no segregation, pores or cracks. For more information, please contact us.

Product detail pictures:

Related Product Guide:

We rely upon strategic thinking, constant modernisation in all segments, technological advances and of course upon our employees that directly participate inside our success for Renewable Design for Nd Sputtering Target - Alcr Alloy Sputtering Target High Purity Thin Film Pvd Coating Custom Made – Rich , The product will supply to all over the world, such as: Morocco, Colombia, Sri Lanka, Our company is an international supplier on this kind of merchandise. We offer an amazing selection of high-quality products. Our goal is to delight you with our distinctive collection of mindful products while providing value and excellent service. Our mission is simple: To provide the best products and service to our customers at the lowest prices possible.

Cobalt Tantalum Zirconium Sputtering Target