Wholesale Renewable Design for Iron Hafnium Sputtering Target - Alcr Alloy Sputtering Target High Purity Thin Film Pvd Coating Custom Made – Rich Manufacturer and Supplier

Renewable Design for Iron Hafnium Sputtering Target - Alcr Alloy Sputtering Target High Purity Thin Film Pvd Coating Custom Made – Rich Featured Image

Short Description:

Product Detail

Product Tags

Feedback (2)

We emphasize development and introduce new products into the market every year for Zirconium Sputtering Target , Pvd Materials , Sputtering Target , We have been sincerely looking forward to developing very good cooperative relationships with buyers from at home and abroad for creating a vibrant foreseeable future together.

Renewable Design for Iron Hafnium Sputtering Target - Alcr Alloy Sputtering Target High Purity Thin Film Pvd Coating Custom Made – Rich Detail:

Aluminum Chromium Sputtering Target Description

Aluminum chromium sputtering target from Rich Special Materials is an alloy sputtering material containing Al and Cr. Thus, the Aluminum chromium sputter target has the advantages of these two elements.

Aluminum, also called aluminum, is a chemical element that originated from the Latin name for alum, ‘alumen’ meaningbitter salt. It was first mentioned in 1825 and observed by H.C.Ã˜rsted. The isolation was later accomplished and announced by H.C.Ã˜rsted. “Al” is the canonical chemical symbol of aluminum. Its atomic number in the periodic table of elements is 13 with a location at Period 3 and Group 13, belonging to the p-block. The relative atomic mass of aluminum is 26.9815386(8) Dalton, the number in the brackets indicating the uncertainty.

Chromium is a chemical element that originated from the Greek ‘chroma’, meaning colour. It was early used before 1 AD and discovered by Terracotta Army. “Cr” is the canonical chemical symbol of chromium. Its atomic number in the periodic table of elements is 24 with a location at Period 4 and Group 6, belonging to the d-block. The relative atomic mass of chromium is 51.9961(6) Dalton, the number in the brackets indicating the uncertainty.

Our typical AlCr targets and their properties

	Cr-70Al at%	Cr-60Al at%	Cr-50Al at%
Purity (%)	99.8/99.9/99.95	99.8/99.9/99.95	99.8/99.9/99.95
Density（g/cm³）	3.7	4.35	4.55
Grain Size(µm)	100/50	100/50	100/50
Process	HIP	HIP	HIP

Rich Special Materials specializes in the Manufacture of Sputtering Target and could produce Chronium Aluminum Silicon Sputtering Materials according to Customers’ specifications. Our products feature excellent mechanical properties, homogeneous structure, polished surface with no segregation, pores or cracks. For more information, please contact us.

Product detail pictures:

Related Product Guide:

With this motto in mind, we've got become among essentially the most technologically innovative, cost-efficient, and price-competitive manufacturers for Renewable Design for Iron Hafnium Sputtering Target - Alcr Alloy Sputtering Target High Purity Thin Film Pvd Coating Custom Made – Rich , The product will supply to all over the world, such as: Kuwait, Sydney, San Francisco, We have won a good reputation among overseas and domestic clients. Adhering to the management tenet of "credit oriented, customer first, high efficiency and mature services", we warmly welcome friends from all walks of life to cooperate with us.

Al/Si Sputtering Targets

Au Pellets

Indium Bar

Oxide Evaporation Material

Silver Wire

Sn Sputtering Target

The sales manager is very patient, we communicated about three days before we decided to cooperate, finally, we are very satisfied with this cooperation!