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Renewable Design for Iron Hafnium Sputtering Target - Alcr Alloy Sputtering Target High Purity Thin Film Pvd Coating Custom Made – Rich

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Our enterprise since its inception, constantly regards product good quality as organization life, constantly improve production technology, strengthen merchandise high quality and continuously strengthen enterprise total good quality administration, in strict accordance with all the national standard ISO 9001:2000 for Silicon Sputtering Target , Ru Sputtering Target , Sputtering Target Sheet , Our company is working through the procedure principle of "integrity-based, cooperation created, people oriented, win-win cooperation". We hope we can have a pleasant relationship with businessman from all around the earth.
Renewable Design for Iron Hafnium Sputtering Target - Alcr Alloy Sputtering Target High Purity Thin Film Pvd Coating Custom Made – Rich Detail:

Aluminum Chromium Sputtering Target Description

Aluminum chromium sputtering target from Rich Special Materials is an alloy sputtering material containing Al and Cr. Thus, the Aluminum chromium sputter target has the advantages of these two elements.

Aluminum, also called aluminum, is a chemical element that originated from the Latin name for alum, ‘alumen’ meaningbitter salt. It was first mentioned in 1825 and observed by H.C.Ørsted. The isolation was later accomplished and announced by H.C.Ørsted. “Al” is the canonical chemical symbol of aluminum. Its atomic number in the periodic table of elements is 13 with a location at Period 3 and Group 13, belonging to the p-block. The relative atomic mass of aluminum is 26.9815386(8) Dalton, the number in the brackets indicating the uncertainty.

Chromium is a chemical element that originated from the Greek ‘chroma’, meaning colour. It was early used before 1 AD and discovered by Terracotta Army. “Cr” is the canonical chemical symbol of chromium. Its atomic number in the periodic table of elements is 24 with a location at Period 4 and Group 6, belonging to the d-block. The relative atomic mass of chromium is 51.9961(6) Dalton, the number in the brackets indicating the uncertainty.

Our typical AlCr targets and their properties

Cr-70Al at%

Cr-60Al at%

Cr-50Al at%

Purity (%)

99.8/99.9/99.95

99.8/99.9/99.95

99.8/99.9/99.95

Density(g/cm3

3.7

4.35

4.55

Grain Size(µm)

100/50

100/50

100/50

Process

HIP

HIP

HIP

Rich Special Materials specializes in the Manufacture of Sputtering Target and could produce Chronium Aluminum Silicon Sputtering Materials according to Customers’ specifications. Our products feature excellent mechanical properties, homogeneous structure, polished surface with no segregation, pores or cracks. For more information, please contact us.


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We emphasize progress and introduce new solutions into the market each year for Renewable Design for Iron Hafnium Sputtering Target - Alcr Alloy Sputtering Target High Purity Thin Film Pvd Coating Custom Made – Rich , The product will supply to all over the world, such as: Japan, belarus, Jeddah, The company attaches great importance to product quality and service quality, based on the business philosophy "good with people, genuine to whole world, your satisfaction is our pursuit". we design products, According to customer's sample and requirements, to meet the needs of the market and offer different customers with personalized service. Our company warmly welcomes friends at home and abroad to visit, to discuss cooperation and seek common development!
  • Although we are a small company, we are also respected. Reliable quality, sincere service and good credit, we are honored to be able to work with you!
    5 Stars By Adela from Lahore - 2018.12.14 15:26
    The customer service staff is very patient and has a positive and progressive attitude to our interest, so that we can have a comprehensive understanding of the product and finally we reached an agreement, thanks!
    5 Stars By Andy from Bulgaria - 2017.03.28 16:34